Method for establishing OPC model

Abstract

A method of building optical proximity correction model comprises the following steps of collecting optical proximity correction data to a database from processes, determining an initial value X0, an end value Xn and a fixed step size h, calculating initial value slope coefficient according to the initial value X0, obtaining an initial optimal step size Y0 according to the initial value slope coefficient, obtaining a first additive value X1 according to the initial value X0 and the initial optimal step size Y0, repeating the steps, working out a second additive valueX2, a third additive value X3,..., till the end value Xn, fitting the initial value X0, the first additive value X1, the second additive value X2, the third additive value X3,..., till an n-1 additive value and the end value Xn. Through the above steps, as step size values can be regulated according to the slope coefficient worked out, regulation step number can be reduced and simulation time is shortened.

Description

technical field [0001] The invention relates to a semiconductor manufacturing process, in particular to a photomask data processing technology, in particular to establishing an optical proximity correction model. Background technique [0002] Current implementations of photomask data bias are typically based on models that have been calibrated in a specific lithographic process, commonly referred to as optical proximity correction models. For example, correction of optical proximity effects (OPE) often requires attempts to "calibrate" the lithographic process in order to compensate for OPE. Existing techniques include associating so-called calibration parameters with an optical proximity correction model, which requires performing a detailed set of optical parameter measurements at different feature locations. The more measurement data collected, the better the accuracy of the calibration parameters. However, reliable optical proximity correction model parameter calibratio...

AI Technical Summary

Problems solved by technology

[0008] In the existing method of making optical proximity correction models, since the step size is a fixed value, if there is a lot of intermediate data between the initial value and the end value, there will be too many adjustment steps and the simulation time will become longer

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