Substrate processing device

A substrate processing device and substrate technology, applied in transportation and packaging, lighting and heating equipment, furnace components, etc., can solve the problems of high cost and large scale of the device, and achieve the effect of low cost and low structure
CN101211756AInactive Publication Date: 2008-07-02TOKYO ELECTRON LTD
1 Cites 22 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
TOKYO ELECTRON LTD
Publication Date
2008-07-02
Estimated Expiration
Not applicable · inactive patent

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The present invention provides a floatable conveying type substrate handling device. Looking in conveying direction (X direction), setting a plurality of rollers or profile rollers (110) with certain distance in a line along conveying direction on two sides of a platform (80). On the platform (80), the basal plate (G) floats in the air using the pressure of gas obtained from the just subjacent ejecting mouth (100) on the platform, and the two ends of the two sides are loaded on the top of the profile roller (110). By means of the rotation motion of the profile roller (110), the basal plate (G) floated on the platform (80) is tossing to convey on the profile rollers (110) and moves towards conveying direction (X direction) in advection mode.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The present invention relates to a floating-transport type substrate processing apparatus that floats a rectangular substrate to be processed on a stage and carries out predetermined processing on the substrate while conveying it in the horizontal direction. Modernized substrate processing equipment. Background technique

[0002] In recent years, in the field of photolithography used in the manufacture of flat panel displays (FPDs), a resist coating apparatus for coating a resist on a substrate to be processed (such as a glass substrate) has adopted a float transfer system.

[0003] A conventional resist coating apparatus employing a floating conveyance method, for example, as disclosed in Patent Document 1, uses a floating stage in which a rectangular substrate to be processed (for example, a glass substrate) is floated by gas pressure. To form a floating conveyance path, and as a conveying device for moving the substrate floating on the table in an ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More