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Substrate processing device

A substrate processing device and substrate technology, applied in transportation and packaging, lighting and heating equipment, furnace components, etc., can solve the problems of high cost and large scale of the device, and achieve the effect of low cost and low structure

Inactive Publication Date: 2008-07-02
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The existing floating transport type substrate processing apparatus needs the above-mentioned guide rails, sliders, vacuum suction pads, etc. for the transport mechanism, so the scale is large and the cost of the apparatus is high.

Method used

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Embodiment Construction

[0069] Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

[0070] FIG. 1 shows a coating and development processing system as one configuration example of a substrate processing apparatus to which the present invention can be applied. The coating and developing processing system 10 is set in a clean room, for example, a rectangular glass substrate is used as the substrate to be processed, and cleaning, resist coating, pre-baking, developing and post-processing in the photolithography process are performed in the LCD manufacturing process. A series of treatments such as baking. Exposure processing is performed in an external exposure device 12 provided adjacent to the system.

[0071] The coating and development processing system 10 is provided with a horizontally wide processing station (processstation: P / S) 16 at the center, and cassette stations (cassettestation: C / S) 14 are provided at both ends in the longitudina...

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PUM

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Abstract

The present invention provides a floatable conveying type substrate handling device. Looking in conveying direction (X direction), setting a plurality of rollers or profile rollers (110) with certain distance in a line along conveying direction on two sides of a platform (80). On the platform (80), the basal plate (G) floats in the air using the pressure of gas obtained from the just subjacent ejecting mouth (100) on the platform, and the two ends of the two sides are loaded on the top of the profile roller (110). By means of the rotation motion of the profile roller (110), the basal plate (G) floated on the platform (80) is tossing to convey on the profile rollers (110) and moves towards conveying direction (X direction) in advection mode.

Description

technical field [0001] The present invention relates to a floating-transport type substrate processing apparatus that floats a rectangular substrate to be processed on a stage and carries out predetermined processing on the substrate while conveying it in the horizontal direction. Modernized substrate processing equipment. Background technique [0002] In recent years, in the field of photolithography used in the manufacture of flat panel displays (FPDs), a resist coating apparatus for coating a resist on a substrate to be processed (such as a glass substrate) has adopted a float transfer system. [0003] A conventional resist coating apparatus employing a floating conveyance method, for example, as disclosed in Patent Document 1, uses a floating stage in which a rectangular substrate to be processed (for example, a glass substrate) is floated by gas pressure. To form a floating conveyance path, and as a conveying device for moving the substrate floating on the table in an ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00H01L21/677B65G49/00B65G49/06
CPCG03F7/2041G03F7/70716H01L21/0274H01L21/67721
Inventor 稻益寿史太田义治池田文彦山崎刚大塚庆崇
Owner TOKYO ELECTRON LTD
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