Photoresist cleaning fluid composition and its application
A composition and cleaning solution technology, applied in optics, optical components, nonlinear optics, etc., can solve the problems of dye back-staining, insufficient photoresist removal, environmental pollution and other problems
Inactive Publication Date: 2011-05-11
ETHICAL INT WAREHOUSING TRADING SHANGHAI
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Problems solved by technology
However, when applied to the cleaning and removal of the above-mentioned color photoresist, the photoresist removal performance cannot be fully exerted, and a large amount of removal liquid must be used, which leads to the problem of waste liquid treatment of organic solvent removal liquid.
[0008] Only the solvent has limited removal effect and the situation of dye back staining will occur, and it will cause environmental pollution. Equipment is needed to suppress the volatilization of solvents
In addition, isopropanol, n-butanol, methyl isobutyl ketone and acetone are flammable solvents with low flash point (<38°C), so there is a risk of fire, and anti-riot equipment should be installed to prevent danger occur, the expenditure on such equipment must increase
Method used
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[0046] The invention is described in further detail using the following specific examples. The following examples have a more specific description of the method for the implementation of the present invention, but the scope of rights claimed by the present invention is not limited to the following examples. Portions not otherwise marked are by weight.
[0047] The cleaning solution composition of the present invention is a material used to form an image after the color photoresist is exposed. The composition and usage amount of the color photoresist are shown in the following table:
[0048]
[0049] Formation of color photoresist film
[0050] A uniform photoresist film can be obtained by mixing the above-mentioned components with a stirrer and coating the solution on the alkali-free glass substrate on which a pattern-shaped light-shielding layer of 20 microns x 20 microns has been formed, and then spin-coating. Into a vacuum oven at room temperature for 5 minutes of sol...
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Abstract
The invention relates to a cleaning fluid constitutes of photoresist agent comprises (a) water, (b)oxy hydrogen fourth order ammonium salt composition, (c) alkylol amine composition and (d) non-ionic interfacial active agent shown as following formula (i), wherein, R1, R2, n and m are defined as the instruction. The cleaning fluid constitutes of photoresist agent incorporating the design is suitable for no-hardened light sensitivity composition photoresist agent, particularly, suitable for colorful optical filter no-hardened light sensitivity composition cleaning fluid.
Description
technical field [0001] The present invention relates to a cleaning solution for photoresist, which can be used in the process of spin-coating photoresist, for the removal of the uncured photosensitive composition coating film attached to the peripheral part, edge part or inner part of the substrate, Or cleaning solution for removing unhardened radiation-sensitive composition attached to the surface of device components or appliances, such as color filters (CF), liquid crystal displays (LCD) or printed circuit boards (PCB). [0002] It is especially suitable for cleaning solution for removing uncured photosensitive composition of color filter. Background technique [0003] Generally, in the process of liquid crystal, organic EL, plasma display and other flat-panel displays or semiconductors and printed circuit boards, in order to obtain fine images, general lithography technology is used to form patterns of photosensitive components, and radiation-sensitive components such as...
Claims
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IPC IPC(8): G03F7/42G02F1/1335G02B5/23
Inventor 刘大铭李晏成廖玉芬
Owner ETHICAL INT WAREHOUSING TRADING SHANGHAI