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NMOS pipe built-in bidirectional thyristor electrostatic protection device

An electrostatic protection device and embedded technology, which is applied in the field of NMOS tube embedded bidirectional thyristor electrostatic protection devices, can solve the problems of limited application range and high trigger voltage

Inactive Publication Date: 2008-10-08
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Although the bidirectional thyristor ESD protection device can provide discharge paths in two directions, the trigger voltage is generally high, which greatly limits its application range

Method used

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  • NMOS pipe built-in bidirectional thyristor electrostatic protection device
  • NMOS pipe built-in bidirectional thyristor electrostatic protection device
  • NMOS pipe built-in bidirectional thyristor electrostatic protection device

Examples

Experimental program
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Embodiment Construction

[0021] Such as image 3 As shown, an NMOS transistor embedded triac electrostatic protection device includes a P-type substrate 3, an N well 6 is arranged on the P-type substrate 3, and the sides of the first T well 1 and the second T well 2 are surrounded by surrounded by N-well 6.

[0022] From the outside to the inside, the first P+ diffused active region 11, the first N+ diffused active region 12 are sequentially arranged on the first T well 1, and the second P+ diffused active region 21 and the second P+ diffused active region 21 are successively arranged on the second T well 2. Two N+ diffused active regions 22; a third diffused active region 7 is provided on the N well 6 between the first T well 1 and the second T well 2, and the two ends of the third diffused active region 7 are respectively arranged across the On the first T well 1 and the second T well 2 , that is, the inner boundaries of the first T well 1 and the second T well and the N well 6 are located below th...

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Abstract

The invention discloses a NMOS pipe embedded type bidirectional controllable silicon static protection device which includes a P-type substrate. A N trap, a first T trap and a second T trap are equipped on the P-type substrate, the N trap surrounds four sides of the first T trap and the second T trap, a P+ diffusion active region and a N+ diffusion active region are arranged on the first T trap and the second T trap, a N+ diffusion active region is arranged on the N trap between the first T trap and the second T trap, surface of the T traps between the N+ diffusion active regions is covered with a multi-crystal silicon layer, the multi-crystal silicon layer is insulated to the first T trap and the second T trap by a SiO2 oxide layer, and each of the diffusion active regions are insulated by a shallow groove. The multi-crystal silicon layer on surface of the T traps between the N+ diffusion active regions, the P+ diffusion active region and the N+ diffusion active region on the T trap are equivalent to an embedded NMOS pipe and can greatly reduce trigger voltage of the bidirectional controllable silicon static protection device.

Description

technical field [0001] The invention relates to the technical field of integrated circuits, in particular to an NMOS tube-embedded bidirectional thyristor electrostatic protection device. Background technique [0002] Electrostatic discharge (ESD, Electron Static Discharge) is an instantaneous process in which a large amount of static charge is poured into the integrated circuit from the outside to the inside when the pins of an integrated circuit are floating, and the whole process takes about 100ns. In addition, hundreds or even thousands of volts of high voltage will be generated during the electrostatic discharge of the integrated circuit, which will break down the gate oxide layer of the input stage in the integrated circuit. With the advancement of integrated circuit technology, the feature size of MOS transistors is getting smaller and smaller, and the thickness of the gate oxide layer is getting thinner. In this trend, high-performance ESD protection devices are used...

Claims

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Application Information

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IPC IPC(8): H01L27/06H01L23/60H01L29/747
CPCH01L29/87H01L29/0649H01L2924/0002
Inventor 朱科翰董树荣韩雁
Owner ZHEJIANG UNIV