Batch preparation of hollow micro-needle based on molding
A micro-needle, hollow technology, applied in the field of medical devices, can solve the problems of silicon is not a biocompatible material, easy to break, unfavorable for batch preparation, etc., and achieve the effect of good biocompatibility and accurate drug delivery
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Embodiment 1
[0019] Example 1: Electrocasting iron-nickel alloy mold pressing metal titanium plate
[0020] (1) Prepare the hard mold of the microneedle array by microfabrication method
[0021] Oxidize the silicon wafer on the (100) plane to obtain a silicon wafer with an oxidation thickness of 2 microns. Use photoresist as a mask to etch silicon oxide windows, then use silicon oxide as a mask, use KOH wet etching to form a cone pit array with a depth of 200-400 microns, and then sputter a metal film on the surface of the cone pits , using the method of electrocasting iron-nickel alloy to form a metal microneedle mold array, such as figure 1 shown.
[0022] (2) Preparation of microwells on biocompatible metal or polymer sheets
[0023] Use a 50-micron titanium sheet and stick it flat on the surface of the silicon wafer. A photoresist hole with a diameter of 40 microns was prepared on the surface of the titanium sheet by photolithography. The pitch of the small hole array is the same ...
Embodiment 2
[0026] Example 2: Electrocasting iron-nickel alloy mold to press polymer plate
[0027] (1) Prepare the hard mold of the microneedle array by microfabrication method
[0028] Oxidize the silicon wafer on the (100) plane to obtain a silicon wafer with an oxidation thickness of 2 microns. Use photoresist as a mask to etch silicon oxide windows, then use silicon oxide as a mask, use KOH wet etching to form a cone pit array with a depth of 200-400 microns, and then sputter a metal film on the surface of the cone pits , using the method of electrocasting iron-nickel alloy to form a metal microneedle mold array, such as figure 1 shown.
[0029] (2) Preparation of microwells on biocompatible metal or polymer sheets
[0030] Use a 50-micron polymethyl methacrylate (PMMA) sheet and stick it flat on the surface of the silicon wafer. A small hole with a diameter of 100 microns was prepared on the surface of the PMMA polymer sheet by laser drilling. The pitch of the small hole array ...
Embodiment 3
[0033] Example 3: Silicon carbonitride die pressing titanium plate
[0034] (1) Prepare the hard mold of the microneedle array by microfabrication method
[0035] Oxidize the silicon wafer on the (100) plane to obtain a silicon wafer with an oxidation thickness of 2 microns. The photoresist is used as a mask to etch a silicon oxide window, and then the silicon oxide is used as a mask to etch a cone pit array with a depth of 200-400 microns by wet etching with KOH. Then fill the cavity with silicon carbonitride powder, and sinter at high temperature to form a silicon carbonitride mold microneedle mold array, such as figure 1 shown.
[0036] (2) Preparation of microwells on biocompatible metal or polymer sheets
[0037] Use a 50-micron titanium sheet and stick it flat on the surface of the silicon wafer. A photoresist hole with a diameter of 40 microns was prepared on the surface of the titanium sheet by photolithography. The pitch of the small hole array is the same as tha...
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Abstract
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