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Auxiliary device for spin coating photoresist on concave spherical device

An auxiliary device and photoresist technology, which is applied in the field of auxiliary fixtures to achieve the effect of convenient operation

Inactive Publication Date: 2011-11-30
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But so far, the experimental research of general concave spherical spin-coated photoresist is still blank in the world.

Method used

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  • Auxiliary device for spin coating photoresist on concave spherical device
  • Auxiliary device for spin coating photoresist on concave spherical device
  • Auxiliary device for spin coating photoresist on concave spherical device

Examples

Experimental program
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Effect test

Embodiment Construction

[0012] Below in conjunction with the embodiment that accompanying drawing provides, the Fang Ming device is described in further detail.

[0013] refer to figure 1 , an auxiliary device for spin-coating photoresist on concave spherical devices, is composed of a chassis 1 with a vertical peripheral wall and a spin-on type that is connected to the rotating shaft of the glue machine through a fastening nut 7 and a washer 10. The cover plate 2 connected to the peripheral wall of the chassis 1 is composed of at least three evenly distributed shoulders 11 on the lower part of the peripheral wall of the chassis 1; the center of the top of the cover plate 2 is provided with a vertical through hole. A sliding shaft 4 that can slide up and down is set in the through hole through a spring 5, and the spring 5 that is about to be sleeved on the outer diameter of the sliding shaft 4 is pre-tightened in the through hole at the top center of the cover plate 2 through a lock nut 6. The lower ...

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PUM

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Abstract

The invention relates to an auxiliary jig for spin-coating photoresist on optical devices, in particular to an auxiliary device for spin-coating photoresist on concave spherical devices. The chassis of the vertical peripheral wall is composed of a cover plate connected to the peripheral wall of the chassis in a turn-buckle type. At least 3 evenly distributed shoulders are arranged on the lower part of the peripheral wall of the chassis; the top center of the cover plate is provided with a vertical To the through hole, a sliding shaft that can slide up and down is provided by a spring in the through hole, and an arc-shaped pressing plate is fixedly arranged at the lower end of the sliding shaft. The auxiliary device of the invention provides feasible technological equipment for realizing the spin-coating photoresist of the concave spherical device, and the operation is convenient, safe and reliable.

Description

field of invention [0001] The invention relates to an auxiliary jig used for spin-coating photoresist on optical devices, in particular to an auxiliary jig used for spin-coating photoresist on concave spherical devices. Background technique [0002] Spin coating is commonly used in microelectronics manufacturing to coat a layer of uniform photoresist film on the surface of optical silicon wafers, and obtain the required fine patterns after exposure and etching. For half a century, photoresist spin coating has been mainly based on planar workpieces. Most of its spin-coating auxiliary devices place the workpiece on a flat rotating disc of the flat glue coating machine, and the edge of the workpiece is tightly fixed on the disc to prevent the workpiece from flying out during rotation. The workpiece will not move up, so the problem of blocking the workpiece from moving up is not considered. During the operation, the workpiece is first installed on the rotating disc with the re...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/16
Inventor 冯晓国赵晶丽梁凤超高劲松
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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