Photomask manufacturing method, pattern copy method, photomask and data base

A manufacturing method and photomask technology are applied in the fields of photomask and database, photomask manufacture, and liquid crystal display device manufacture.
CN101382729BActive Publication Date: 2011-12-07HOYA CORP
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Patent Information

Authority / Receiving Office
CN Β· China
Patent Type
Patents(China)
Current Assignee / Owner
HOYA CORP
Publication Date
2011-12-07

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Abstract

A method for manufacturing photo-mask, method for transferring pattern, photo-mask, and database is provided to obtain gray mask efficiently as desired by using exposure unit reproduce an exposure condition in the database. In a method for manufacturing photo-mask, a test exposure to the test mask in which the predetermined test pattern is molded is performed by using excellent exposure condition, and transmission light pattern of this test pattern with the imaging device is obtained. A transmission light pattern data is obtained based on the obtained transmission light pattern. Effectiveness transmittance of the test pattern under the exposure condition is obtained based on transmission light pattern data. The manufacturing method of photo-mask wherein the film thickness of the material is formed under the predetermined exposure condition on the pattern layout including the half light-transmitting part, and the domain including the half light-transmitting part or the domain is determined based on the effectiveness transmittance.
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Description

technical field

[0001] The present invention relates to a photomask manufacturing method, a pattern replication method, a photomask, and a database for manufacturing photomasks used in the manufacture of electronic components, and more particularly, to designing light by simulating effective transmittance A photomask manufacturing method for a mask, a pattern replication method, a photomask, and a database. The present invention also particularly relates to a multi-grayscale photomask (hereinafter, also referred to as a gray-tone (gray-tone) mask) having a light-shielding portion, a light-transmitting portion, and a translucent portion through which a part of the exposure light passes. A photomask manufacturing method, a photomask, a pattern replication method, and a database for designing a pattern shape of a semi-transparent portion, and designing a film thickness and a film material of a semi-transparent film.

[0002] Also, as an electronic component is a display device r...

Claims

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