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Optical mechanism horizontal adjustment method and apparatus thereof

A technology of optical mechanism and level adjustment, which is applied in the direction of using optical devices, optics, measuring devices, etc.

Active Publication Date: 2009-03-18
CHROMA ELECTRONICS SHENZHEN
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The technical problem to be solved by the present invention is to solve the problem of determining the coordinates of the rotation center of the rotation mechanism in the aforementioned known technology, and provide a horizontal adjustment of the optical mechanism that shortens the time spent in determining the rotation center and obtains more accurate rotation center coordinates method and device

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  • Optical mechanism horizontal adjustment method and apparatus thereof
  • Optical mechanism horizontal adjustment method and apparatus thereof
  • Optical mechanism horizontal adjustment method and apparatus thereof

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Embodiment Construction

[0014] refer to figure 1 As shown, it is a system component correlation diagram of the optical mechanism level adjustment device of the present invention. The optical mechanism level adjustment device of the present invention includes a height measuring device 1, an operation control unit 2, an object carrying device 3 and an object to be measured 4, and is used to obtain the surface profile of the object to be measured 4 by measuring the surface topography of the object to be measured 4 After the plane equation, the surface inclination angle of the object 4 to be measured is further obtained.

[0015] In the aforementioned optical mechanism level adjustment device of the present invention, the height measuring device 1 includes an image capture device 11, an optical mechanism 12, a light source device 13 and a rough height sensor 14, which are used to measure the height coordinate parameters of any position on the surface of the object to be measured . Wherein the image cap...

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Abstract

The invention relates to an optical facility level adjustment method and a device thereof. The optical facility level adjuster comprises a height measurer, an operation control unit, an object carrier and an object, to measure the surface figure of the object under each axis inclination angle, calculate or fit the plane equation of the object under different states and utilize geometric relation and the plane equation to find the rotation center of a rotary mechanism, and obtain the conversion relation between the leveled coordinate and the initial coordinate, therefore, the measurement can be leveled without returning to the rotation center and the measurement can be leveled on any part of an object platform.

Description

technical field [0001] The invention relates to a method for adjusting the level of an optical mechanism and a device thereof, which particularly provides a measurement of the level of a sample to be measured to achieve the adjustment of the optical mechanism. Background technique [0002] In the known technology of white light interferometric analyzers to measure microscopic surface topography, most of them need to adjust the level of the sample to be tested to improve the measurement accuracy and shorten the scanning range, which is beneficial to the improvement of measurement speed and accuracy. , so that this type of white light interference analyzer measurement technology can analyze the surface topography down to the nanometer level. [0003] However, in this type of known white light interference analyzer measurement technology, one of the horizontal adjustment methods of the sample to be measured is to manually adjust the inclination angle of the stage carrying the s...

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Application Information

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IPC IPC(8): G01N13/10G12B5/00G02B7/00G01B11/24
Inventor 林耀明
Owner CHROMA ELECTRONICS SHENZHEN