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Laser processing method and laser processing apparatus

A laser processing method and laser beam technology, applied in metal processing, laser welding equipment, metal processing equipment and other directions, can solve problems such as low productivity and low processing efficiency, and achieve the effect of high-efficiency laser processing

Inactive Publication Date: 2009-05-13
HITACHI ZOSEN CORP
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0009] First, in the technology of Patent Document 1, the number of laser oscillators is the same as the number of layers to be processed, so the radiation of the board or the laser beam must move an extra distance in the X direction and the Y direction, resulting in low processing efficiency and productivity. low problem

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  • Laser processing method and laser processing apparatus
  • Laser processing method and laser processing apparatus
  • Laser processing method and laser processing apparatus

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Embodiment Construction

[0040] The present invention uses the following structure to achieve efficient processing when laser beams different in intensity and wavelength are irradiated in multiple stages in pattern formation of electronic circuit boards.

[0041] In the present invention, as the plurality of laser beams and the workpiece are moved relative to each other, the irradiation positions of the laser beams are also changed according to their relative movement, so the laser beams irradiate the workpiece in order of different wavelengths and intensities as described above.

[0042] use Figure 1 to Figure 3 Preferred embodiments of the present invention will be described in detail.

[0043] figure 1 It is an example showing the basic structure of the laser processing apparatus of this invention. figure 2 yes figure 1 The laser processing device of the present invention, but shows its moving direction and figure 1 The opposite situation. image 3 It is a schematic diagram explaining anothe...

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Abstract

The present invention provides a method and an apparatus for efficiently processing in patterning of an electronic circuit board even when laser beams of differing intensities and wavelengths are irradiated in multiple stages. A laser processing apparatus is provided with first and second laser oscillators (2a, 2b) for emitting laser beams (3a, 3b) of which at least the wavelength or the intensities are different from each other; a stage apparatus (5) for moving a workpiece (1) to be processed; and optical systems (4a, 4b) for guiding the laser beams (3a, 3b) to prescribed positions of the workpiece (1). The optical systems (4a, 4b) can be moved by means of an adjusting device (6) according to the relative moving direction of the laser beams (3a, 3b) and the workpiece (1) to permit the prescribed position of the workpiece (1) to be irradiated with laser beams (3a, 3b) in that order so that the workpiece (1) can be processed by the laser beams (3a, 3b). Thus, efficient laser processing can be performed without limiting the relative moving direction of the laser beams and the workpiece and without unnecessary movement.

Description

technical field [0001] The present invention relates to a method of processing a workpiece using a laser beam, and a device using the method. Background technique [0002] In the past, when using laser beam radiation to cut or weld workpieces, or to remove, for example, only a specific layer from the surface of a workpiece, laser beams with different intensities and wavelengths were sometimes irradiated in multiple stages for, for example, preheating and main processing , or remove the first layer and remove the second layer. [0003] For example, Patent Document 1 discloses a technique for improving the processing efficiency in this case, which uses a row of laser oscillators, the number of which is as many as the number of layers to be processed, and each laser oscillator emits only for a specific layer effective laser beam. [0004] Patent Document 1: Japanese Patent Application Publication No. H08-10970. [0005] In addition, in the technique disclosed in Patent Docum...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/06B23K26/08H05K3/00H05K3/08B23K101/42
CPCH05K2201/0338H05K3/0026B23K2201/42B23K26/0676B23K26/0608H05K2203/108H05K3/027B23K26/0021B23K26/0604B23K26/0006B23K2101/42B23K2103/00B23K2103/56
Inventor 福田直晃国盐和良中山茂昭
Owner HITACHI ZOSEN CORP
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