Semiconductor device
A semiconductor and device technology, applied in the field of semiconductor devices, to achieve the effect of reducing warpage
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no. 1 example
[0179] A semiconductor device having substantially the same structure as that of the above-described embodiment is manufactured. Meanwhile, although in the embodiment described above, the solder bumps are provided on the rear surface of the first substrate, in the first embodiment, a terminal is provided for detecting connecting resistance between the substrates.
[0180] The first substrate and the second substrate consist of the same layer structure and layer material. In particular, the first and second substrates are provided with a stack (thickness of approximately 36 microns) alternately provided with three insulating layers and four conductor interconnect layers, and a core layer (thickness 45 microns).
[0181] In Table 1, the resin composition of the insulating layer used for the lamination of the first substrate and the second substrate is shown. In addition, the resin composition of the insulating layer used for the core layer of the first substrate and the second ...
no. 2 example
[0197] The composition of the insulating layer of the laminate is as follows, and other aspects are the same as those of the first embodiment.
[0198] Table 2
[0199] resin
[0200]
no. 3 example
[0202] The composition of the insulating layer of the core layer is as follows, and other aspects are the same as those of the first embodiment.
[0203] The average thermal expansion coefficient of the insulating layer of the core layer in the temperature range from 25°C to its glass transition temperature along the in-plane direction of the substrate is 8ppm / °C, and in the temperature range from 25°C to its glass transition temperature along the thickness direction of the substrate The average coefficient of thermal expansion is 12 ppm / °C.
[0204] table 3
[0205] resin
PUM
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