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Vapor delivery system useful with ion sources and vaporizers for use in such system

A vaporizer, ion source technology, used in drum brakes, brake types, mechanical equipment, etc.

Inactive Publication Date: 2009-06-24
SEMEQUIP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

An advantageous way to implement this is by providing in-situ cleaning of system components using highly reactive reagents, but this introduces other safety concerns

Method used

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  • Vapor delivery system useful with ion sources and vaporizers for use in such system
  • Vapor delivery system useful with ion sources and vaporizers for use in such system
  • Vapor delivery system useful with ion sources and vaporizers for use in such system

Examples

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example ： example 1：1 and 2， or 3 and 4。 example 2

[0156] The tight controls required to prevent mixing of hazardous vapor combinations for enabling flow from the gasifier can be subordinated to pre-established protocols implemented by the control logic in the electromechanical control system. Similarly, mechanical interlocks may have provisions for changing modes of operation. In some cases, controls are established that absolutely prevent communication between gasifiers or between selected gasifiers. On the other hand, the control may implement the allowance of simultaneous flow for certain gasifiers. This is appropriate and applicable where the gasifier contains the same feed material. For example, simultaneous flow can be used when the charge in one gasifier is approaching depletion, and although there is a need to utilize the entire charge for economic reasons, it is also necessary to start using an alternate gasifier. This strategy has the advantage of ensuring an adequate supply of vapor without pushing the heating li...

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PUM

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Abstract

The present invention discloses a vapor conveying system and a method thereof, which controls the heating and flowing of vapor that comes from the solid feed-in material (especially the material comprising cluster module) for semiconductor manufacturing. The system and the method convey the vapor to the using point safely and effectively, especially to the ion source for ion implantation. The exhibition of ion beam implantation uses the ion from the cluster material. The vapor conveying system comprises the reactive gas cleaning and control system of the ion source and a protocol thereof, an abroad dynamic range flow control system and an effective and safe gasifier selection. The borane, decaborane, carborane, carbon cluster and other macromolecules are gasified for ion implantation. The system of the invention is exhibited for cooperating with the novel gasifier, the ion source and the reactive cleaning system.

Description

technical field [0001] The present invention relates to the generation and delivery of vapor to a vapor receiving device within a high vacuum chamber. The present invention also relates to the delivery of ionizable vapors to high voltage ion sources that provide ion beams for ion implantation in the fabrication of semiconductor devices and materials. The present invention has particular relevance to systems and methods for vaporizing and ionizing materials forming molecular ions containing multiple atoms of related species. Background technique [0002] In industry, it is often necessary to transfer highly toxic unstable materials in vapor form to device or substrate materials within high vacuum systems. Periodically, the devices must be serviced for cleaning or replacement of parts, and for refilling or replacing the charging source and performing maintenance services. Each instance of refill or service requires disengaging and re-engaging the vacuum seal, and performing ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F16D49/00
Inventor 道格拉斯·R·亚当斯德罗尔·奥韦德托马斯·N·霍尔斯基
Owner SEMEQUIP
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