Unlock instant, AI-driven research and patent intelligence for your innovation.

Photosensitive paste composition, barrier ribs prepared using the composition and plasma display panel comprising the barrier ribs

A technology of composition and mixture, applied in the field of PDP, can solve problems such as inability to use

Inactive Publication Date: 2009-07-29
SAMSUNG SDI CO LTD
View PDF2 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the photolithographic method described above has fundamental disadvantages
Although a predetermined amount of titanium dioxide, aluminum oxide, yttrium oxide, or zinc oxide powder is used to improve reflectivity when using the sandblasting method or etching, such powders cannot be used in single-exposure lithography methods because the powders have a very high Refractive index, so as to fail to minimize the refractive index of organic components and prevent the transmission of ultraviolet rays irradiated during exposure

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive paste composition, barrier ribs prepared using the composition and plasma display panel comprising the barrier ribs
  • Photosensitive paste composition, barrier ribs prepared using the composition and plasma display panel comprising the barrier ribs

Examples

Experimental program
Comparison scheme
Effect test

preparation Embodiment 1

[0124] Preparation Example 1. Magnesium Fluoride (MgF 2 ) Preparation of precursor

[0125] By adding 203.3g magnesium chloride (MgCl 2 ·6H 2 O) be dissolved in 5L ion-exchanged water to prepare magnesium chloride aqueous solution, and by 188.26g potassium fluoride (KF 2H 2 O) Dissolve in 5L ion-exchanged water to prepare potassium fluoride aqueous solution. 10 L of ion-exchanged water was added to a 50 L reactor, and an aqueous magnesium chloride solution and an aqueous potassium fluoride solution were simultaneously added to the reactor at a rate of 10 ml / sec while vigorously stirring. Then, the mixture was concentrated using a vacuum concentrator until the volume of the mixture reached 2 L. The concentrated solution was aged by heating at 95°C for 24 hours to prepare a gel. Then, the electrolyte was removed from the gel using an ultrafiltration membrane, and the resultant was concentrated again using a vacuum concentration device until the volume of the mixture rea...

preparation Embodiment 2

[0126] Preparation Example 2. Sodium Magnesium Fluoride (NaMgF 3 ) Preparation of precursor

[0127] Sodium magnesium fluoride (NaMgF) dispersed in diethylene glycol was prepared in the same manner as in Preparation Example 1 3 ) precursor, except that an aqueous sodium fluoride solution prepared by dissolving 126 g of sodium fluoride (NaF) in 5 L of ion-exchanged water was used instead of an aqueous potassium fluoride solution.

preparation Embodiment 3

[0128] Preparation Example 3. Silica-magnesium fluoride (SiO 2 -MgF 2 ) Preparation of precursor

[0129] By adding 203.3g magnesium chloride (MgCl 2 ·6H 2 O) Dissolving in 5L of ion-exchanged water to prepare an aqueous solution of magnesium chloride, preparing an aqueous solution of silica sol by diluting 300 g of silica sol (10% by weight, average particle diameter: 5 nm) in 5 L of ion-exchanged water, and preparing an aqueous solution of silica sol by dissolving 74.08 g of ammonium fluoride (NH 4 F) Dissolving in 5L ion-exchanged water to prepare ammonium fluoride aqueous solution. The prepared aqueous silica sol solution was added to a 50 L reactor, and the magnesium chloride aqueous solution was added to the reactor at a rate of 10 ml / sec while vigorously stirring. Then, 300 g of a 0.1N hydrochloric acid solution was added thereto. Then, an aqueous solution of ammonium fluoride was added to the reactor at a rate of 10 ml / sec. Then, a silica-magnesium fluoride...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
thicknessaaaaaaaaaa
particle sizeaaaaaaaaaa
Login to View More

Abstract

The present invention relates to a photosensitive paste composition, a barrier ribs prepared using the composition and a plasma display panel. The photosensitive paste composition includes: a fluoride sol dispersed in an organic material; and an inorganic material, wherein an average refractive index of the fluoride sol N1 and an average refractive index of the inorganic material N2 satisfy Mathematical Formula 1 below: -0.2<=N1-N2-0.2. Mathematical Formula 1 By using the photosensitive paste composition, a barrier rib pattern for a high-resolution and high-precision PDP can be prepared through a single light exposure and a PDP having high brightness can be manufactured since the barrier ribs have high reflectance compared to conventional barrier ribs.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to Korean Application No. 2008-6708 filed in the Korean Intellectual Property Office on Jan. 22, 2008, the disclosure of which is incorporated herein by reference. technical field [0003] Aspects of the present invention relate to a photosensitive paste composition, a barrier rib for a plasma display panel (PDP) prepared using the composition, and a PDP including the barrier rib. More specifically, aspects of the present invention relate to a photosensitive paste composition that enables barrier rib patterns for high-resolution and high-precision PDPs to be prepared by a single exposure and provides barrier ribs having higher reflectance than conventional barrier ribs, A barrier rib for PDP prepared using the composition, and a PDP comprising the barrier rib. Background technique [0004] In a plasma display panel (PDP) structure, barrier ribs are formed on a lower panel (or rear subs...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/075G03F7/00H01J9/227C09J133/02C09J133/04C08L33/02C08L33/04B82Y20/00B82Y30/00B82Y40/00C04B35/00C04B35/632C08F2/44G03F7/027G03F7/038H01J11/12H01J11/22H01J11/24H01J11/26H01J11/34H01J11/36
CPCG03F7/0007C03C8/14G03F7/0047H01J11/36C03C8/22C03C8/24H01J9/242H01J11/12H01J2211/366Y10T428/24149G03F7/0042G03F7/0043G03F7/0045
Inventor 李范旭崔钟书崔龟锡姜东贤林明德
Owner SAMSUNG SDI CO LTD