Method for forming an electronic device on a flexible metallic substrate and resultant device
A technology of metal substrates and electronic devices, applied in the direction of electric solid devices, electrical components, semiconductor devices, etc., can solve problems such as limitations, substrate material types, and differences in thermal expansion coefficients
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Embodiment 1
[0030] In one embodiment, the material used for carrier 18 is a stainless steel sheet having a thickness of approximately 50.8 millimeters. Substrate 20 is a stainless steel foil having a thickness of approximately 0.762 millimeters.
[0031] Using these materials, the TFT fabrication process using the flexible substrate 20 is as follows:
[0032] 1. Surface preparation. exist Figure 4 In this step shown in the perspective view of , a thin Teflon (PTFE) coating is applied as adhesive material 30 onto the contact surface 32 of the flexible substrate 20 . This can be applied using any suitable deposition technique. For smaller substrates 20, a thickness of about 0.127 to 1.27 millimeters is sufficient; this thickness can vary with the desired stiffness and area of the flexible substrate 20.
[0033] 2. Positioning. The substrate 20 is positioned so that it is centered on the retention surface 24 on the carrier 18 .
[0034] 3. Lamination. Substrate 20 is laminated to car...
Embodiment 2
[0040] In another embodiment, the adhesive temporarily secures the substrate 20 to the carrier 18 . Subsequently, the TFT manufacturing steps are as follows:
[0041] 1. Fixing the substrate 20 to the carrier 18 . The flexible substrate 20 is bonded to the carrier 18 . This is done by applying an adhesive of suitable thickness or peel strength to substrate 20 and / or carrier 18 . Pressure or a combination of heat and pressure may be used to bond substrate 20 in place. Squeeze out trapped air from between the carrier and substrate.
[0042] 2. Planarization. In some applications, the desired surface roughness for TFT deposition may be below about 0.2 to 0.3 microns peak-to-peak or better. Planarizing materials can be added to the exposed substrate surface to achieve this level of smoothness.
[0043] 4. Formation of an electrical insulating layer. As a final surface preparation step (which may be optional) for modifying the surface of the substrate, an electrically insula...
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Abstract
Description
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