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TFT-LCD array substrate structure and preparation method thereof

An array substrate structure and substrate technology, applied in semiconductor/solid state device manufacturing, instruments, semiconductor devices, etc., can solve the impact of array substrate yield, increase array substrate process or color filter substrate process steps, array substrate and color filter substrate The overall process has no problems such as convenience, and achieves the effect of improving the display performance of TFT-LCD, simplifying the preparation process, and reducing the accuracy of the box

Active Publication Date: 2009-09-16
K TRONICS (SUZHOU) TECH CO LTD +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, using this method to prepare the black matrix layer usually simply transfers the preparation process of the color filter substrate to the array substrate, which is not convenient for the overall process of the array substrate and the color filter substrate; and the defects produced by this method are also Obviously: due to the preparation of the array substrate and the color filter substrate in one set of processes, the steps of the array substrate process or the color filter substrate process are increased, which has a great impact on the yield rate of the array substrate

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  • TFT-LCD array substrate structure and preparation method thereof
  • TFT-LCD array substrate structure and preparation method thereof
  • TFT-LCD array substrate structure and preparation method thereof

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Embodiment Construction

[0052] Figure 1a It is a plan view of the TFT-LCD array substrate structure of the present invention. Such as Figure 1a As shown, the TFT-LCD array substrate structure includes a gate line 22, a data line 53 and a pixel electrode 6. The gate line 22 and the data line 53 define a pixel area, and a TFT is formed at the intersection, and the TFT includes a grid connected to the gate line 22. The electrode 21, the TFT channel 43, the drain electrode 51 and the source electrode 52, wherein the source electrode 52 is connected to the data line 53, the drain electrode 51 is overlapped with the pixel electrode 6, and the black matrix 7 is formed on the area other than the pixel electrode 6.

[0053] Figure 1b It is a structural schematic diagram of the first embodiment of the TFT-LCD array substrate structure of the present invention, which is Figure 1a Middle A-A sectional view. Such as Figure 1b As shown, the TFT-LCD array substrate structure includes a substrate 1, a gate el...

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Abstract

The invention relates to a TFT-LCD array substrate structure and a preparation method thereof. The substrate structure comprises a gate line, a data line and a pixel electrode pattern which are formed on the substrate; a thin film transistor is formed at the intersection of the gate line and the data line; a pixel electrode is formed on a gate insulating layer and lapped on a drain electrode of the thin film transistor; and a black matrix pattern is formed on the region out of the pixel electrode pattern. The invention prepares the TFT-LCD array substrate structure containing the black matrix pattern only by three times of mask process, thereby significantly simplifying the preparation process of the array substrate, improving the yield of the array substrate and reducing the cost. In addition, as the black matrix is prepared on the TFT-LCD array substrate, the requirements on the precision of a box by a liquid crystal display panel are significantly reduced, causing no impacts on the aperture ratio of the TFT-LCD and being conductive to improve the display performance of the TFT-LCD.[0].

Description

technical field [0001] The invention relates to the field of display, in particular to a thin film transistor liquid crystal display array substrate structure and a preparation method thereof. Background technique [0002] Thin Film Transistor Liquid Crystal Display (TFT-LCD for short) has the characteristics of small size, low power consumption, and no radiation, and occupies a dominant position in the current flat panel display market. For TFT-LCD, the color display performance of TFT-LCD is one of the important factors affecting the overall performance of TFT-LCD. [0003] During the color display process of TFT-LCD, if the backlight light or external light enters the thin film transistor (Thin Film Transistor, referred to as: TFT) device or leaks from other non-pixel areas (ie: light leakage phenomenon), it will affect the TFT- The display effect of the LCD is adversely affected. For example: the active layer in a TFT device is usually a light-sensitive material (such ...

Claims

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Application Information

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IPC IPC(8): G02F1/1362H01L27/12H01L21/84G03F7/42
CPCH01L27/1288H01L29/78633
Inventor 郝金刚
Owner K TRONICS (SUZHOU) TECH CO LTD