300mm vertical oxidation furnace heat preservation barrel

A technology of oxidation furnace and heat preservation barrel, which is applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems of complex manufacturing process, production line loss, and high cost, and achieves simple manufacturing process, prevention of contamination of silicon wafers, and low cost. Effect

Inactive Publication Date: 2009-10-07
BEIJING SEVENSTAR ELECTRONICS CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although this kind of insulation barrel has better heat insulation effect, the production process is complicated, the cost

Method used

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  • 300mm vertical oxidation furnace heat preservation barrel
  • 300mm vertical oxidation furnace heat preservation barrel
  • 300mm vertical oxidation furnace heat preservation barrel

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Example Embodiment

[0010] The present invention will be further explained below in conjunction with the accompanying drawings and embodiments: Example: see the accompanying drawings, a 300mm vertical oxidation furnace insulation barrel is provided with a bottom quartz plate 1, a middle quartz plate 2, a support rod 3 and a top quartz plate 4. There are 4 support rods, which are vertically fixed and installed between the bottom quartz plate and the top quartz plate. The number of quartz plates are 19, and they are fixedly installed on the support rods evenly spaced in the lateral direction; the upper surface of the top quartz plate is provided with 3 fixed groove 4.1 for fixing the quartz boat. The bottom quartz plate and the top quartz plate are annular; the middle quartz plate is in the shape of a disc, and the structure of the middle quartz plate is the OP material layer 2.1 in the middle, and the upper and lower layers and the periphery are covered by high-purity transparent quartz plates Layer 2...

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Abstract

The invention discloses a 300mm vertical oxidation furnace heat preservation barrel, which is characterized by being provided with a bottom quartz plate (1), intermediate quartz sheets (2), supporting rods (3) and a top quartz plate (4); a plurality of supporting rods are vertically and fixedly installed between the bottom quartz plate and the top quartz plates; a plurality of quartz sheets are transversely, uniformly and fixedly installed on the supporting rods at intervals; and the upper surface of the top quartz plate is provided with a fixing groove (4.1) which is used for fixing a quartz boat. The bottom quartz plate and the top quartz plate are in the shape of circular ring; the intermediate quartz sheets are in the shape of circular sheet, and the structure of the intermediate quartz sheets is an OP material layer (2.1) in the middle and a high-purity transparent quartz plate material coating layer (2.2) on the upper layer, lower layer and the periphery. The invention is applicable to the support and heat preservation of the quartz boat of a vertical oxidation furnace, has complete structure, good heat preservation effect and high cleanness, and can ensure the processing quality.

Description

technical field [0001] The invention belongs to a silicon chip processing device, in particular to a thermal insulation barrel for an oxidation furnace used in a silicon chip heating and oxidation process. Background technique [0002] Silicon wafer is an important semiconductor material, and its processing, especially oxidation treatment, is a very precise process. At present, most of the silicon wafer oxidation furnaces used in China are horizontal structures. Vertical oxidation furnaces have been widely used in the world to oxidize silicon wafers. In order to improve the heat preservation effect, in the past, vacuum insulation barrels were often used, that is, quartz plates were welded into a cylindrical cavity, and the interior was filled with quartz wool or other heat insulation materials. In order to prevent these materials from polluting the process, the usual practice is to seal them in quartz. The inside of the chamber is vacuumed at the same time to prevent burst...

Claims

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Application Information

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IPC IPC(8): H01L21/316
Inventor 钟华董金卫赵星梅胡星强艾伦·埃马米
Owner BEIJING SEVENSTAR ELECTRONICS CO LTD
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