Unlock instant, AI-driven research and patent intelligence for your innovation.

Surface treatment method and apparatus, exposure method and apparatus, and device manufacturing method

A surface treatment device and surface treatment technology, which are applied in the fields of surface treatment and surface treatment devices, exposure and exposure devices, and component manufacturing, can solve problems such as exposure device performance degradation, device performance degradation, and poor exposure, and achieve suppression of poor exposure , The effect of suppressing the generation of defective components and suppressing the occurrence of bad exposure

Inactive Publication Date: 2009-10-14
NIKON CORP
View PDF30 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When such a bad situation occurs, it may cause the performance of the exposure device to deteriorate, and poor exposure occurs.
[0007] In addition, not only liquid immersion exposure apparatuses, but also manufacturing apparatuses that use liquids to manufacture elements, for example, coating apparatuses that coat a substrate with a solution including a photosensitive material, or developing apparatuses that develop exposed substrates using a developing solution, etc., When liquid remains on the surfaces of the various components constituting these manufacturing devices, it may also lead to deterioration of the performance of the device, resulting in defective components

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Surface treatment method and apparatus, exposure method and apparatus, and device manufacturing method
  • Surface treatment method and apparatus, exposure method and apparatus, and device manufacturing method
  • Surface treatment method and apparatus, exposure method and apparatus, and device manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0074] Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In addition, in the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each member is demonstrated referring this XYZ orthogonal coordinate system. Also, the predetermined direction in the horizontal plane is defined as the X-axis direction, the direction perpendicular to the X-axis direction in the horizontal plane is defined as the Y-axis direction, and the directions perpendicular to the X-axis direction and the Y-axis direction (that is, Vertical direction) is set as the Z-axis direction. In addition, the rotation (tilt) directions around the X-axis, Y-axis, and Z-axis are referred to as θX, θY, and θZ directions, respectively.

[0075] The first embodiment:

[0076] The first embodiment will be described. figure 1 It is a schematic configuration diagram showing the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Surface treatment method and surface treatment apparatus, exposure method and exposure apparatus and device manufacturing method, wherein the surface treatment method includes an operation which imparts energy to the object in a state where the surface of the object has been brought into contact with a prescribed fluid in order to reduce the surface energy of the object which has liquid repellency.

Description

technical field [0001] The present invention relates to a surface treatment method and a surface treatment device of an object, an exposure method and an exposure device for exposing a substrate, and a device manufacturing method. [0002] This application claims priority based on Japanese Patent Application No. 2006-310278 filed on November 16, 2006, the contents of which are incorporated herein by reference. Background technique [0003] Among the exposure devices used in the photolithography process, there is a liquid immersion exposure device for exposing a substrate through a liquid as disclosed in the following patent documents. [0004] "Patent Document 1" International Publication No. 99 / 49504 pamphlet. [0005] Conventionally, various measuring means for irradiating with light for exposure have been installed in the exposure apparatus. In the liquid immersion exposure apparatus, a case where a liquid immersion region of a liquid is formed on the measurement member...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70341G03F7/7095G03F7/20
Inventor 谷裕久
Owner NIKON CORP