Long laminated sub-wave reflection-reducing structure and preparation method thereof

A sub-wavelength, stacked technology, applied in the field of micro-nano photonics, can solve problems such as the overall performance limitation of the device

Inactive Publication Date: 2010-06-09
SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] The purpose of the present invention is to propose a novel sub-wavelength anti-reflection structure and its preparation method to solve the limitations of the existing sub-wavelength structure in improving the overall performance of the device

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  • Long laminated sub-wave reflection-reducing structure and preparation method thereof
  • Long laminated sub-wave reflection-reducing structure and preparation method thereof
  • Long laminated sub-wave reflection-reducing structure and preparation method thereof

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Embodiment Construction

[0028] In order to break through the limitation of the existing sub-wavelength structure in improving the overall performance of the device, the present invention discloses a laminated sub-wavelength anti-reflection structure, and the shape of the sub-wavelength anti-reflection structure is calculated according to the wavelength and angle range of the incident light to be de-reflected. It is characterized in that: the laminated subwavelength antireflection structure includes two parts: the first part is to form a subwavelength pattern on the surface of the high refractive index material that needs antireflection by etching; the second part is to form a subwavelength pattern on the first part of the subwavelength pattern The surface of the dielectric layer is re-deposited and grown, and the two are integrated to form a stacked sub-wavelength anti-reflection structure.

[0029] The subwavelength antireflection structure can be prepared by the following technical solutions:

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Abstract

The invention discloses a long laminated sub-wave reflection-reducing structure comprising a long sub-wave pattern and a medium layer, wherein the long sub-wave pattern is formed by etching the surface of a material with high refractive index required to reduce the reflection; the medium layer is formed by growing on the surface of the long sub-wave pattern by sediment; the long sub-wave pattern and the medium layer form a long laminated sub-wave structure; and the structural pattern is obtained according to the distribution of the refractive index of the used material and the wavelength and the angle range of incident light required to reduce the reflection. The long sub-wave reflection-reducing structure is applied to an active photoconducting device with high refractive index surface and can really and effectively achieve the transmission effect of a broadband wide angle. Compared with the prior art, the invention can effectively passivate the long laminated sub-wave reflection-reducing structure, reduce non-radiation recombination centers, inhibit the on-radiation recombination loss and effectively increase the corresponding performance of the photoconducting device; in addition, based on the sequential change of the refractive indexes of air, medium materials and substrate materials, by adopting the long laminated sub-wave reflection-reducing structure, the preparation difficulty can be weaken or better reflection-reducing performance can be obtained under the same condition.

Description

technical field [0001] The invention relates to a nanostructure, in particular to a subwavelength antireflection structure suitable for solar cell systems, light display surface emission devices, etc. requiring wide-spectrum and wide-angle incoming and outgoing light and a preparation method thereof, belonging to the field of micro-nano photonics. Background technique [0002] The interface reflectivity between substances with different refractive indices is an important parameter that affects the performance of light-receiving, emitting, and transmitting optical devices and equipment. The extremely low interface reflectivity is pursued in the fields of light display, broad-spectrum light source, solar cell, lens, etc. Important indicators. Typically, vapor-deposited optical anti-reflection coatings are used to reduce optical interface reflections. In order to reduce the interface reflectivity as much as possible in a wide-angle and wide-spectrum range, it is usually necess...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/11
Inventor 张瑞英
Owner SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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