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Coating method and device of plasma substrate pattern layer

A plasma-based, plasma-based technology, applied in the coating field of ionic substrate layers, can solve the problems of low coating efficiency and uneven coating, and achieve the effect of improving coating efficiency and overcoming the problem of uneven coating

Inactive Publication Date: 2010-06-09
SICHUAN COC DISPLAY DEVICES
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present invention aims to provide a method and device for coating a plasma substrate layer, which can solve the problems of uneven coating and low coating efficiency.

Method used

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  • Coating method and device of plasma substrate pattern layer
  • Coating method and device of plasma substrate pattern layer
  • Coating method and device of plasma substrate pattern layer

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Embodiment 1

[0019] figure 1 It is a flowchart of a coating method of a plasma substrate layer according to an embodiment of the present invention. like figure 1 As shown, the coating method of the plasma substrate layer mainly includes:

[0020] S102, setting a layer of mask on the plasma substrate, wherein the mask has the same hollow structure as the pattern to be coated;

[0021] S104, coating the slurry on the plasma substrate with the above mask;

[0022] S106, drying the applied slurry;

[0023] S108, removing the mask from the plasma substrate.

[0024] Here, the mask may be an adhesive tape or a plastic film, or the mask may also be formed of other materials having a masking effect.

[0025] The following uses adhesive tape as an example to describe the characteristics of the mask, and the following characteristics are also applicable to plastic films or other materials that have a masking effect.

[0026] figure 2 A schematic plan view of an adhesive tape according to an ...

Embodiment 2

[0039] Figure 8 A schematic diagram of a coating device for a plasma substrate layer according to an embodiment of the present invention. The coating device of the plasma substrate layer mainly includes: a mask setting part 802, which is used to set a layer of mask on the plasma substrate, wherein the mask has the same hollow as the pattern to be coated structure; coating part 804, used for coating the slurry on the plasma substrate with the mask; drying part 806, used for drying the coated slurry; removing part 808, used for The mask is removed from the plasma substrate.

[0040] Here, the mask setting part 802 may be a roller; the coating part 804 may be a nozzle.

[0041] The mask is an adhesive tape or a plastic film, wherein the thickness of the mask is T<A+B, where A represents the thickness of the slurry to be coated on the plasma substrate, and B represents the thickness used to coat the plasma substrate. The gap between the nozzle of a slurry and the wet film form...

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Abstract

The invention provides coating method and device of a plasma substrate pattern layer, wherein the coating method comprises the following steps of: arranging a mask on a plasma substrate, wherein the mask has a hollow structure the same as a pattern to be coated; coating slurry on the plasma substrate with the mask; drying the coated slurry; and removing the mask from the plasma substrate. Because the mask is arranged on the substrate, the problem of non-uniform coating is overcome. In addition, due to the existence of the mask, continuous coating can be realized so as to achieve the effect of improving the coating efficiency.

Description

technical field [0001] The invention relates to the field of manufacturing color display screens, in particular to a method and device for coating a plasma substrate layer. Background technique [0002] In the coating process of the upper substrate dielectric layer of the plasma flat plate, the lower substrate dielectric layer of the plasma flat plate, and the barrier layer on multiple sides (generally more than 4 sides), since the coating units to be formed on the substrate need to be spaced apart from each other, as a coating After coating a single row of coating units, the nozzles of the coating equipment need to perform actions such as "stop-lift-move to the next row of coating units", so that the edge of the coating starting position at the interval is generated. Uneven, and the operation process of "stop-lift-move to the next row of coating units" reduces the operating efficiency. [0003] In addition, during the coating process of the plasma front plate medium using ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J9/20
Inventor 赵之明田玉民宋利建
Owner SICHUAN COC DISPLAY DEVICES
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