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Electroplating equipment for electrode of silicon solar cell slice

A technology of silicon solar cells and electroplating equipment, which is applied in the manufacture of circuits, electrical components, semiconductors/solid-state devices, etc., can solve the problems of uneven production costs of electroplating layers, reduced conductivity of silicon wafers, and low solar energy conversion rate of silicon wafers. Achieve the effect of improving solar energy conversion rate, simple and compact structure, and reducing production cost

Inactive Publication Date: 2010-06-30
CHINA ELECTRONIC TECH GRP CORP NO 2 RES INST
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  • Abstract
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Problems solved by technology

[0003] The electrode electroplating spray cup for silicon solar cells provided by the present invention solves the problem of the large area ratio between the wires on the solar cell and the silicon chip in the prior art, and at the same time, the silver paste is mixed with organic matter, which will reduce the conductivity of the silicon chip. , resulting in the disadvantages of low solar energy conversion rate of silicon wafers, uneven electroplating layer and high production cost technical problems

Method used

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  • Electroplating equipment for electrode of silicon solar cell slice
  • Electroplating equipment for electrode of silicon solar cell slice
  • Electroplating equipment for electrode of silicon solar cell slice

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Embodiment Construction

[0016] Silicon solar cell electrode electroplating equipment, including a frame 37, multiple groups of independent plating solution tanks 38, plating solution pumps, delivery pipelines 39 and electroplating rectifier power supplies 43 arranged in the frame 37, set on the frame 37 There is a closed cover body 40, and the top of the closed cover body 40 is provided with a left and right horizontal driving guide rail 41. On the driving guide rail 41, a transport trolley 42 that can move left and right horizontally and vertically move up and down is provided. The left end of the working surface is provided with the feeding level 44 of the silicon chip, the lower material level 45 of the silicon chip is arranged at the right end of the working surface of the frame, and the above-mentioned multiple groups are arranged between the upper material level 44 and the lower material level 45 The electroplating solution tank 38 is provided with a spray cup 36 in each group of electroplating ...

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Abstract

The invention discloses electroplating equipment for an electrode of a silicon solar cell slice, solving the problems of small area ratio between polycrystalline silicon occupied area and impressed lead area and poor coating quality of a single solar cell slice in the prior art. The equipment comprises a plurality of groups of electroplate liquid troughs (38), electroplate liquid pumps and delivery lines (39) and electroplated rectifiers power supplies (43) which are arranged in a frame (37) and are mutually independent, a travelling crane guide rail (41) and a delivering trolley (42) are arranged on the inner top of a sealed cover body (40), a plurality of groups of the electroplating liquid troughs (38), spraying cups (36) and conductive needle fixation and regulation mechanisms (25) are arranged between a charging position and a discharging position, the lower cavity (23) of the spraying cup is fixedly provided with an electroplating anode fixing frame (26) and an electroplating anode net (27), and the outer cavity of the lower cavity (23) of the spraying cup is provided with an electroplating anode extraction column (35) and an electroplate liquid inlet, thus improving the quality of the single polycrystalline silicon slice.

Description

technical field [0001] The invention relates to an electroplating device, in particular to a device for electroplating electrodes of silicon solar cells. Background technique [0002] The production process of solar cells is to first cut crystalline silicon into silicon wafers, and then use screen printing technology to print silver paste into grid line electrodes after the cut silicon wafers are processed by various processes. The interval between the printed grid lines on the silicon wafer should not be too small, and the width of the screen printed grid lines on the silicon wafer should not be too narrow, so that the wires on the solar cell printed by silver paste printing technology and the silicon wafer The area ratio is large; at the same time, the silver paste is mixed with organic matter, which will reduce the conductivity of the silicon wafer, which leads to the disadvantage of low solar energy conversion rate of the silicon wafer. In addition, because the coplanar...

Claims

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Application Information

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IPC IPC(8): C25D7/12H01L21/288
Inventor 欧萌赵晓明张蕾胡子卿孟晓涛谢振民
Owner CHINA ELECTRONIC TECH GRP CORP NO 2 RES INST