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A method for damping an object, an active damping system, and a lithographic apparatus

An object and damping technology, applied in microlithography exposure equipment, optomechanical equipment, mechanical equipment, etc., can solve problems such as limiting the damping performance of the ceiling

Active Publication Date: 2010-06-30
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] Typically, frame resonances limit the performance of ceiling damping, resulting in limited reduction in overlay errors caused by frame motion

Method used

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  • A method for damping an object, an active damping system, and a lithographic apparatus
  • A method for damping an object, an active damping system, and a lithographic apparatus
  • A method for damping an object, an active damping system, and a lithographic apparatus

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Embodiment Construction

[0024] figure 2 A lithographic apparatus according to an embodiment of the invention is schematically shown. The lithographic apparatus comprises: an illumination system (illuminator) IL configured to condition a radiation beam B (e.g., ultraviolet (UV) radiation or any other suitable deep ultraviolet (DUV) radiation); a patterning device support Or a support structure (eg mask table) MT configured to support a patterning device (eg mask) MA and connected to a first positioning device PM configured to precisely position the patterning device MA according to determined parameters. The apparatus also includes a substrate table (e.g., wafer table) WT or "substrate support" configured to hold a substrate (e.g., a resist-coated wafer) W and configured for A second positioner PW for precisely positioning the substrate W is connected. The apparatus also includes a projection system (e.g. a refractive projection lens system) PS configured to project the pattern imparted to the radi...

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PUM

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Abstract

A method for damping an object in two or more degrees of freedom, including measuring a position quantity at each of the two or more measurement locations; extracting from the measured position quantities a measurement signal for each dynamic mode; feeding the measurement signal of a dynamic mode to a controller unit associated with the respective dynamic mode, the controller unit providing for each dynamic mode an output signal on the basis of the respective measurement signal; and providing a control signal to each of the two or more actuators, the control signal for each actuator being based on output signals of one or more controller units.

Description

technical field [0001] The invention relates to a method for damping an object, an active damping system and a lithographic apparatus. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred by imaging the pattern onto a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single substrate will contain a network of adjacent target portions that are successively patterned. Known lithographic apparatu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05D19/02G03F7/20
CPCG03F7/709F16F15/002G03F7/203G03F7/70125G03F7/70716G03F7/70758
Inventor H·布特勒M·W·M·范德维斯特
Owner ASML NETHERLANDS BV