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Device for producing low-carbon environment-friendly super clean high-purity H2O2

A H2O2, low-carbon and environmentally friendly technology, applied in the direction of peroxide/peroxy hydrate/peroxyacid/superoxide/ozonide, inorganic chemistry, non-metallic elements, etc., can solve the short service life of membrane reverse osmosis equipment , Resin decomposition explosion, power consumption and other problems, to save labor, reduce emissions, and save energy

Inactive Publication Date: 2012-01-11
HEGLN DALIAN PHARMA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] 1) The H purified by the quartz tower vacuum distillation unit 2 o 2 The purity of aqueous solution can only reach the product standard of analytical purity, and the output rate of raw materials is very low. If there are multiple towers for circular purification production, the production cost is very high. Not only does the production process consume a lot of electric energy, but also the safety is very high. Difference
[0006] 2) Membrane filtration purification device, industrial grade H 2 o 2 H purified by membrane reverse osmosis system 2 o 2 Aqueous solution products, the purity can reach high purity H 2 o 2 requirements, but the raw material output rate is only below 60%, and the service life of membrane reverse osmosis equipment is very short, so the production cost is much higher than other methods
[0007] 3) The adsorption ion exchange device can produce products with higher purity and lower cost, but the production process is extremely prone to H 2 o 2 Dangerous accidents related to resin decomposition and explosion, especially after the resin fails, acid and alkali are used to regenerate the failed resin, causing great pollution to the environment

Method used

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  • Device for producing low-carbon environment-friendly super clean high-purity H2O2
  • Device for producing low-carbon environment-friendly super clean high-purity H2O2
  • Device for producing low-carbon environment-friendly super clean high-purity H2O2

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Experimental program
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Effect test

Embodiment 1

[0045] The data of the resin membrane separation system equipment under the following working conditions are shown in Table 1: the working pressure is 0.2Mpa; the temperature is controlled at 10 to 23°C; the working flow rate (working fluid flow rate) is controlled at 500 kg / h. The EDI system equipment is filled with yin and yang fluorine resin (Rohm and Haas), the ratio of the yin and yang fluorine resin is 3:2, and the volume of EDI system resin is 0.05m 3 -0.3m 3 . The working conditions of the EDI system are: the voltage is more preferably 40v; the current is 0.5A; the working pressure of the EDI purification system is 0.2Mpa. The working pressure of the nanofiltration membrane filtration system is 0.2Mpa; the pore size of the nanofiltration membrane is 0.01um.

[0046] From the data in Table 1, it can be seen that the purified and refined H 2 O 2 The aqueous solution fully complies with the SEMI-12 quality standard of the International Semiconductor Equipment and Materials O...

Embodiment 2

[0048] The data of the resin membrane separation system equipment under the following working conditions is shown in Table 1: The working conditions of the resin membrane separation system equipment are: working pressure at 0.4Mpa; temperature control at 18°C-28°C; working flow rate ( Working fluid flow rate) is controlled at 400kg / h. The EDI system equipment is filled with yin and yang fluororesin (Rohm and Haas), the ratio of the yin and yang fluorine resin is 3:2, and the best resin volume is 0.05m 3 -0.3m 3 . The working conditions of the EDI system are: voltage 90v; current 0.8A; working pressure of the EDI purification system is 0.5Mpa. The working pressure of the nanofiltration membrane filtration system is 0.5Mpa; the pore size of the nanofiltration membrane is 0.01um.

[0049] From the data in Table 1, it can be seen that the purified and refined H 2 O 2 The aqueous solution fully complies with the SEMI-12 quality standard of the International Semiconductor Equipment an...

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Abstract

The invention provides a device for producing low-carbon environment-friendly super clean high-purity H2O2. The device comprises a raw material groove, a power pump, a raw material pre-treating system, a resin membrane separating system, an EDI purifying system, a nano-filtration membrane filtering system and a finished product receiving tank, wherein the raw material groove is connected with theinlet of the power pump; the outlet of the power pump is connected with a raw material pre-treating inlet; a raw material pre-treating outlet is connected with the inlet of the resin membrane separating system; the outlet of the resin membrane separating system is connected with the inlet of the EDI system; the outlet of the EDI system is connected with a nano-filtration membrane filtering inlet;and a nano-filtration membrane filtering outlet is connected with the finished product tank. The device is safe, simple and easy to operate, and decomposition reactions between H2O2 and separating and purifying devices are prevented, so safety and reliability is achieved; and the device discharges little or no waste acid alkali regenerated liquid, so the device prevents environment pollution, saves a large amount of energy source, greatly reduces carbon dioxide emission, and is very suitable for the international popular low-carbon emission process.

Description

Technical field [0001] The invention relates to a low-carbon environment-friendly ultra-clean high-purity H 2 O 2 Production equipment. Background technique [0002] Ultra clean high purity H 2 O 2 It is an indispensable and important electronic chemical cleaning product and corrosive agent for microelectronics, semiconductors, super large scale film integrated circuits (IC), and aerospace precision instruments and equipment. This is because H 2 O 2 The purity and cleanliness of the ultra-large film integrated circuit (IC) have an extremely significant impact on the yield and electrical performance reliability. As the storage of super-large film integrated circuits (IC) continues to increase, its capacity is also increasing, and its oxide film has become thinner. However, the alkali metal impurities in the electronic chemical cleaning products and corrosives that use IC, such as calcium (Ca), sodium (Na) and other impurities will melt into the oxide film, which will lead to a de...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B15/013
Inventor 张平均张玓瓅李静李朝军
Owner HEGLN DALIAN PHARMA