Method for manufacturing holographic grating
A holographic grating and holographic recording technology, which is applied in the field of holographic gratings, can solve the problems of substrate aberration deterioration, difficulty and difficulty in manufacturing low-diffraction wave aberration holographic gratings, etc., to reduce manufacturing difficulty, reduce manufacturing difficulty and production cost, reduce Effect of processing difficulty and processing cost
Inactive Publication Date: 2010-09-22
苏州同路光电科技有限公司
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Problems solved by technology
For optical substrates that need to be coated with multi-layer dielectric films, the aberration of the substrate is likely to deteriorate further after coating, which brings great difficulties to the production of holographic gratings with low diffraction wave aberrations
Under the technical level of existing optical substrate processing, coating, and holographic optical recording, it is very difficult to manufacture meter-scale gratings and achieve their diffractive wave aberration indicators below 0.1 wavelength
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Embodiment 1
[0049] Comparison of the diffracted wave aberration of the large-scale grating made by the ordinary holographic recording method and the method of the present invention.
[0050]A one-dimensional holographic grating with a size of 200mm×400mm was fabricated by a common holographic recording method, and the spatial frequency of the grating was 1740lp / mm. The recording wavelength is 413.1nm, the two recording light beams are parallel light beams, the incident angles are both 21°, and the two recording light waves have no aberration. Assuming that the surface shape of the grating substrate coated with photoresist is 0.5 wavelength (the detection wavelength is 632.8nm), holographic exposure is performed on the substrate to make a holographic grating. When a beam of parallel light is incident on the holographic grating at the Littrow angle (that is, the incident angle is equal to the first-order diffraction angle of the grating, and the incident angle is 33.4°), the diffraction wav...
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The invention discloses a method for manufacturing a grating with a low diffracted wave aberration on a grating substrate having aberrations. The method comprises the following steps of: forming a holographic record interference light field by a parallel light writing light beam and the other parallel light writing light beam with an adjustable wave surface; performing holographic exposure on a holographic record substrate; and performing development to obtain the needed grating. The method is characterized in that: a distorting lens is put into a divergent light path of one of the writing light beams, and the holographic record interference light field used for compensating the base aberration of the holographic grating is obtained by controlling the distorting lens. In the process, the distorting lens, a distorting lens controller and an interferometer form a closed-loop control and detection system of the holographic record interference light field; and the holographic record interference light field obtained after adjusting the distorting lens is used for exposing the holographic record substrate coated with a photosensitive material, recording the holographic grating, and performing the development to finish the manufacturing of the needed grating with the low diffracted wave aberration.
Description
technical field [0001] The invention relates to a method for preparing a diffraction optical element, in particular to preparing a holographic grating with low diffraction wave aberration on a large-scale optical substrate with aberration. Background technique [0002] Large-scale one-dimensional planar diffraction gratings are the key components of many large-scale high-tech engineering projects. In order to meet the requirements of the laser inertial confinement fusion system for laser energy technical indicators, the diffraction grating must be large in size and low in diffraction aberration. The grating production system usually consists of two parts: a holographic optical system and a recording substrate. The holographic optical system is used to generate a holographic recording interference light field. The recording substrate is coated with a photosensitive material. The interference fringes formed by interference are recorded by the photosensitive material, and then ...
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IPC IPC(8): G03H1/12G02B5/18
CPCG03H2001/0439G03H1/04G02B5/1857G02B5/32G02B26/0825
Inventor 李朝明陈新荣潘君骅吴建宏胡祖元
Owner 苏州同路光电科技有限公司
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