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Preparation method of Raman scattering substrate

A Raman scattering and substrate technology, applied in Raman scattering, measuring devices, instruments, etc., can solve the problems of limited surface area of ​​Raman scattering substrate, unfavorable adsorption of molecules to be detected, difficulty in obtaining highly sensitive Raman scattering substrate, etc.

Active Publication Date: 2010-10-20
TSINGHUA UNIV +1
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Problems solved by technology

However, the metal particles are easy to agglomerate on the surface of the planar substrate, and the Raman scattering substrate prepared by this method has a limited surface area, which is not conducive to the adsorption of molecules to be detected. Therefore, it is difficult to obtain highly sensitive Raman scattering by the above method. base

Method used

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  • Preparation method of Raman scattering substrate

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Embodiment Construction

[0024] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0025] see figure 1 , a method for preparing a Raman scattering substrate 10 provided in the first embodiment of the present invention, which includes the following steps:

[0026] S10, providing a carbon nanotube film structure 11, the carbon nanotube film structure 11 comprising a plurality of carbon nanotubes connected by van der Waals force; and

[0027] S20, immerse at least part of the carbon nanotube film structure 11 in a first solution until a plurality of metal particles are deposited on the surface of the carbon nanotube film structure 11, the first solution includes a plurality of metal ions, and the standard of the metal ion The electrode potential is greater than the Fermi energy of the carbon nanotubes, so that the metal ions are reduced to form metal particles deposited on the at least part of the carbon nanotube film structure.

[0028] In ...

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Abstract

The invention relates to a preparation method of a Raman scattering substrate. The preparation method comprises the following steps: providing a carbon nanotube film structure which comprises a plurality of carbon nanotubes connected by a van der waals force; and infiltrating at least part of the carbon nanotube film structure in a first solution until a plurality of metal particles are deposited on the surface of the carbon nanotube film structure, wherein the first solution comprises a plurality of metal ions, and a standard electrode potential of the metal ion is larger than Fermi energy of the carbon nanotube.

Description

technical field [0001] The invention relates to a detection system of a Raman scattering substrate. Background technique [0002] The preparation of a stable and high enhancement factor Raman scattering substrate is an important basis for studying the effect of surface-enhanced Raman scattering. The traditional method for preparing a Raman scattering substrate is mainly to form a Raman scattering substrate by forming a plurality of metal particles on the surface of a flat substrate. However, the metal particles are easy to agglomerate on the surface of the planar substrate, and the Raman scattering substrate prepared by this method has a limited surface area, which is not conducive to the adsorption of molecules to be detected. Therefore, it is difficult to obtain highly sensitive Raman scattering by the above method. base. Contents of the invention [0003] In view of this, it is indeed necessary to provide a method for preparing a highly sensitive Raman scattering subs...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/65
CPCG01N21/658
Inventor 孙颖慧刘锴姜开利范守善
Owner TSINGHUA UNIV
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