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System and method for implementing a virtual metrology advanced process control platform

An advanced process control and virtual measurement technology, which is applied in the direction of measuring devices, measuring electricity, and measuring electrical variables, etc., can solve the problem of not being able to obtain wafers one by one

Active Publication Date: 2010-12-08
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In the past, one of the major limitations of advanced process control has been the inability to obtain real-time wafer-to-wafer (W2W) measurement data

Method used

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  • System and method for implementing a virtual metrology advanced process control platform
  • System and method for implementing a virtual metrology advanced process control platform

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Embodiment Construction

[0025] The invention relates to advanced process control of integrated circuit manufacturing, in particular to a system and method for setting a virtual measurement advanced process control platform. In the present invention, the specific embodiments are only used as examples to teach the broader inventive concepts, and those skilled in the art can easily apply the techniques disclosed in the present invention to other methods and systems. Moreover, the systems and methods discussed in the present invention include some well-known structures and / or steps, which are only used as a general level discussion for detailed discussion because they are well known. Furthermore, for the convenience of description, the repeated element labels in the illustrations are only examples, and the repetition of the multiple element labels does not imply any necessary combination of features or steps.

[0026] Figure 1A Known virtual measuring principles for individual processes. The module 100...

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Abstract

System and method for implementing a Virtual Metrology ('VM') Advanced Process Control ('APC') platform are described. In one embodiment, the VM APC system comprises a process tool for processing a plurality of wafers, a metrology tool for measuring a sample wafer of the plurality of wafers and generating actual metrology data therefor, and a VM model for predicting metrology data for each of the plurality of wafers. The system also includes an APC controller for receiving the predicted metrology data and the actual metrology data and generating a process input of the process tool based on the received data. In the inventive VM APC system, process parameters after updating or modulating are not needed to perfrom individual measurement procedure, based on chip by chip control.

Description

technical field [0001] The invention relates to an advanced process control (Advanced Process Control, APC) of integrated circuit manufacturing, and in particular to a system and method for setting a virtual measurement (virtual metrology, VM) advanced process control platform. Background technique [0002] Advanced process control has become an indispensable technology in semiconductor manufacturing to improve component yield and reliability at low cost. Important foundations of advanced process control include integrated metrology, fault detection and classification, and run-to-run control. Advanced process control helps reduce process variation and production costs. The key to effective advanced process control is that the measuring instrument must measure key parameters within an acceptable time frame. In addition, methods (for advanced process control) must be provided to analyze and interpret the data measured by the measurement equipment. In fact, because the proce...

Claims

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Application Information

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IPC IPC(8): H01L21/66H01L21/00G01R31/26
CPCH01L22/20H01L22/12G01R31/2894
Inventor 蔡柏沣曾衍迪宋金宁
Owner TAIWAN SEMICON MFG CO LTD
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