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Method for plating easily-oxidized film on micro-size granules through magnetic control sputtering

A magnetron sputtering coating and magnetron sputtering coating technology, which is applied in the field of preparation and preservation of easily oxidized metal films, can solve the problems of affecting the uniformity of the coating, lack of good packaging measures, and reunion, so as to achieve protection from oxidation, Guarantee the effect of not being deliquescent

Inactive Publication Date: 2012-07-04
NANJING UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method is simple in equipment and convenient in application. Films can be grown well within the particle size range of 100 microns. However, for powders with a particle size of less than 10 microns, the powder cannot fall in the sieve by gravity alone. And agglomeration is prone to occur during the rotation of the drum, which affects the uniformity of the coating
When it is necessary to sputter-plate easily oxidizable films on the powder, such as aluminum, iron, etc., the invention has no good packaging measures to protect the coating on the powder from being oxidized

Method used

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  • Method for plating easily-oxidized film on micro-size granules through magnetic control sputtering
  • Method for plating easily-oxidized film on micro-size granules through magnetic control sputtering
  • Method for plating easily-oxidized film on micro-size granules through magnetic control sputtering

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] Implementation Example 1: Magnetron Sputtering Copper Plating on Fe Powder Particles

[0040] 1) Firstly, put the raw materials of Fe particles to be grown into the vacuum chamber together with the packaging.

[0041] 2) Vacuum the vacuum chamber, and at the same time fill the interior with argon or nitrogen with a purity higher than 99.9%, so that the partial pressure of oxygen in the vacuum chamber is lower than 10Pa, and then open the package of powder particles. Install the required Cu target on the magnetron sputtering target frame.

[0042] 3) Close the vacuum chamber, and use a mechanical pump and a vacuum molecular pump to evacuate the entire vacuum growth chamber, so that the final air pressure in the vacuum chamber is kept at 2.0×10 -3 Pa to 5.0×10 -3 Pa range.

[0043] 4) Fill the vacuum chamber with argon.

[0044] 5) Turn on the vibration motor, adjust the vibration power to 50W, and adjust the rotation speed of the motor and the ultrasonic vibration powe...

Embodiment 2

[0049] Implementation example 2: Magnetron sputtering Al plating on B powder particles

[0050] 1) Firstly put the raw materials of B particles to be grown into the vacuum chamber together with the packaging.

[0051] 2) Vacuum the vacuum chamber, and at the same time fill it with argon or nitrogen with a purity higher than 99.9%, so that the oxygen partial pressure in the vacuum chamber is lower than 10Pa, and then open the powder particle package. Install the required Al target material on the magnetron sputtering target frame.

[0052] 3) Close the vacuum chamber, use a mechanical pump and a vacuum molecular pump to evacuate the entire vacuum growth chamber, so that the final air pressure in the vacuum chamber is kept at 2.0×10 -3 Pa to 5.0×10 -3 Pa range.

[0053] 4) Fill the vacuum chamber with argon.

[0054] 5) Turn on the vibration motor, adjust the vibration power to 50W, adjust the rotation speed of the motor and the ultrasonic vibration power.

[0055] 6) Turn ...

Embodiment 3

[0059] Implementation Example 3: Magnetron sputtering Al-Mg alloy on Fe powder particles.

[0060] 1) Firstly, put the raw materials of Fe particles to be grown into the vacuum chamber together with the packaging.

[0061] 2) Vacuum the vacuum chamber, and at the same time fill it with argon or nitrogen with a purity higher than 99.9%, so that the oxygen partial pressure in the vacuum chamber is lower than 10Pa, and then open the powder particle package. Install the required aluminum-magnesium alloy target on the magnetron sputtering target frame.

[0062] 3) Close the vacuum chamber, use a mechanical pump and a vacuum molecular pump to evacuate the entire vacuum growth chamber, so that the final air pressure in the vacuum chamber is kept at 2.0×10 -3 Pa to 5.0×10 -3 Pa range.

[0063] 4) Fill the vacuum chamber with argon.

[0064] 5) Turn on the vibration motor, adjust the vibration power to 50W, adjust the rotation speed of the motor and the ultrasonic vibration power. ...

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Abstract

The invention discloses a method for plating an easily-oxidized film on micro-size granules through magnetic control sputtering. In the method, the dispersion of powder and the growth and encapsulation of the easily-oxidized film under ultralow oxygen partial pressure are completed by using equipment such as a vacuum cavity, a vacuum system, a magnetic control sputtering film plating system, a vibration sieve, a power supply and the like so as to obtain the micro-size granules on which the easily-oxidized film is plated finally. A single layer or multiple layers of laminated films are plated on the surfaces of the micro-size granules through a certain process, so that the micro-size granules have the properties of the original composition materials and have the characteristics of plating materials; therefore, the micro-size granules have the wide application prospects in each industry.

Description

technical field [0001] The invention relates to a preparation and preservation technology of an easily oxidizable metal thin film, in particular to the technology of growing Al, Fe, Co, Ni, Cu easily oxidizable thin films on micro-nano particles and the packaging technology of samples. Background technique [0002] Due to the characteristics of small volume and large specific surface area, microparticles have many advantages that bulk materials do not have, mainly surface effect and volume effect. As the volume decreases and the specific surface area increases, the effects of catalysis and adsorption associated with the surface properties will be significantly enhanced, and the magnetic, electrical, and optical properties will also change significantly as the volume decreases. The microparticle surface film is a material composed of several different types of granular materials such as non-polar non-metallic, metal or organic polymers, which are coated with a single layer or...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/14
Inventor 袁国亮徐锋杜宇雷陈光
Owner NANJING UNIV OF SCI & TECH