Method for plating easily-oxidized film on micro-size granules through magnetic control sputtering
A magnetron sputtering coating and magnetron sputtering coating technology, which is applied in the field of preparation and preservation of easily oxidized metal films, can solve the problems of affecting the uniformity of the coating, lack of good packaging measures, reunion, etc., to achieve protection from oxidation, Guaranteed not to be deliquified
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Embodiment 1
[0039] Implementation Example 1: Magnetron Sputtering Copper Plating on Fe Powder Particles
[0040] 1) Firstly, the raw material of Fe particles to be grown is packaged and put into the vacuum chamber.
[0041] 2) Vacuum the vacuum chamber, and at the same time fill the interior with argon or nitrogen with a purity higher than 99.9%, so that the partial pressure of oxygen in the vacuum chamber is lower than 10Pa, and then open the package of powder particles. Install the required Cu target on the magnetron sputtering target frame.
[0042] 3) Close the vacuum chamber, use a mechanical pump and a vacuum molecular pump to evacuate the entire vacuum growth chamber, so that the final air pressure in the vacuum chamber is kept at 2.0×10 -3 Pa to 5.0×10 -3 Pa range.
[0043]4) Fill the vacuum chamber with argon.
[0044] 5) Turn on the vibration motor, adjust the vibration power to 50W, and adjust the rotational speed of the rotating motor and the ultrasonic vibration power.
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Embodiment 2
[0049] Implementation example 2: Magnetron sputtering Al plating on B powder particles
[0050] 1) Firstly, put the raw materials of B particles to be grown into the vacuum chamber together with the packaging.
[0051] 2) Vacuum the vacuum chamber, and at the same time fill the interior with argon or nitrogen with a purity higher than 99.9%, so that the partial pressure of oxygen in the vacuum chamber is lower than 10Pa, and then open the package of powder particles. Install the required Al target material on the magnetron sputtering target frame.
[0052] 3) Close the vacuum chamber, and use a mechanical pump and a vacuum molecular pump to evacuate the entire vacuum growth chamber to keep the final air pressure in the vacuum chamber at 2.0×10 -3 Pa to 5.0×10 -3 Pa range.
[0053] 4) Fill the vacuum chamber with argon.
[0054] 5) Turn on the vibration motor, adjust the vibration power to 50W, adjust the rotation speed of the motor and the ultrasonic vibration power.
[0...
Embodiment 3
[0059] Implementation Example 3: Magnetron sputtering Al-Mg alloy on Fe powder particles.
[0060] 1) Firstly, put the raw materials of Fe particles to be grown into the vacuum chamber together with the packaging.
[0061] 2) Vacuum the vacuum chamber, and at the same time fill the interior with argon or nitrogen with a purity higher than 99.9%, so that the partial pressure of oxygen in the vacuum chamber is lower than 10Pa, and then open the package of powder particles. Install the required aluminum-magnesium alloy target on the magnetron sputtering target frame.
[0062] 3) Close the vacuum chamber, and use a mechanical pump and a vacuum molecular pump to evacuate the entire vacuum growth chamber to keep the final air pressure in the vacuum chamber at 2.0×10 -3 Pa to 5.0×10 -3 Pa range.
[0063] 4) Fill the vacuum chamber with argon.
[0064] 5) Turn on the vibration motor, adjust the vibration power to 50W, adjust the rotation speed of the motor and the ultrasonic vibra...
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