Etching method and substrate having conductive polymer

A conductive polymer, etching technology, applied to the conductive layer, circuit, electrical components and other directions on the insulating carrier, can solve the problems of difficult to make ink, conductive polymer is easy to agglomerate, etc., to achieve the effect of stable etching
CN101981098BInactive Publication Date: 2013-01-09TSURUMISODA +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
TSURUMISODA
Publication Date
2013-01-09
Estimated Expiration
Not applicable · inactive patent

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Abstract

An object of the present invention is to provide an etching method that enables control of etching of a conductive polymer using a specific cerium (IV) compound to be carried out simply and easily, thus ensuring that etching is carried out stably, and to provide a substrate having a conductive polymer that has been etched by the etching method. The etching method of the present invention includes an etching step of etching a conductive polymer using an etching liquid containing a specific cerium (IV) compound, an analysis step of analyzing the etching liquid by at least one analysis means selected from the group consisting of oxidation-reduction potential measurement, oxidation-reduction titration, and electrical conductivity measurement, and a control step of controlling the etching step according to the results obtained in the analysis step.
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Description

technical field

[0001] The invention relates to an etching method and a substrate with conductive polymers. Background technique

[0002] At present, as a transparent conductive film, ITO (indium tin oxide) containing indium (In) is mainly used, but it is also estimated that In is a rare element with a recoverable reserve of 3,000 tons, and it will be around 2011 to 2013. Recoverable reserves are exhausted, and an alternative material to ITO that does not use In is currently being studied. The conductivity of conductive polymers has been significantly improved, and conductive polymers are expected to be used as substitute materials for ITO.

[0003] This conductive polymer has the characteristics of conductivity, light transmission, luminescence, and flexibility after film formation, and its application to transparent conductive films, electrolytic capacitors, antistatic agents, batteries, and organic EL elements is being studied. , part of which has been practical. [00...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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