Annular light source test platform

A platform and light source technology, applied in the field of electromechanical, can solve problems such as damage to the reticle, and achieve the effect of improving the quality and improving the quality of the reticle.
CN102012377AInactive Publication Date: 2011-04-13GUDENG PRECISION IND CO LTD
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Patent Information

Authority / Receiving Office
CN Β· China
Patent Type
Applications(China)
Current Assignee / Owner
GUDENG PRECISION IND CO LTD
Publication Date
2011-04-13
Estimated Expiration
Not applicable Β· inactive patent

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Abstract

The invention discloses an annular light source test platform, which belongs to electromechanics. The annular light source test platform comprises a bearing frame and a plurality of lighting pieces, wherein the bearing frame comprises a bearing platform and a bracket, wherein the bearing platform can be used for fixedly placing a preinstalled photomask; the bracket supports the bearing platform; the lighting pieces are a certain distance from the bearing frame and are arranged on the bearing frame in a surrounding way; and each of the lighting pieces is arranged towards the bearing frame. By using the structure, not only a falling risk which is possible to be caused by artificially gripping the photomask is improved, but also multi-angle test can be provided, so that the lighting quality can be improved and a visual dead angle is avoided.
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Description

technical field

[0001] The invention relates to electromechanical devices, and aims to provide a ring-shaped light source inspection platform, especially a ring-shaped light source inspection platform that can effectively inspect particles on a photomask to improve the quality of inspection objects. Background technique

[0002] Wafers are the most important material for manufacturing semiconductors, and the main raw material for manufacturing wafers is silicon dioxide. The wafers undergo hundreds of processing procedures such as deposition, etching, heating, photoresist treatment, coating, and development. A single wafer can produce tens or even hundreds of integrated circuit semiconductors according to its different sizes, and in order to produce wafers with different circuits and electronic components, a photomask is required for pre-design.

[0003] A photomask can be said to be a mold for making a wafer. When an integrated circuit company designs a circuit design for a ...

Claims

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