Method of manufacturing semiconductor device and mask
A semiconductor and device technology, which is applied in the field of manufacturing semiconductor devices and masks, can solve problems such as bump pitch narrowing, and achieve the effects of bump pitch narrowing, productivity improvement, and yield improvement
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[0029] Herein, the invention will now be described with reference to exemplary embodiments. Those skilled in the art will recognize that many alternative embodiments can be accomplished using the teachings of the present invention and that the invention is not limited to the embodiments illustrated for explanatory purposed.
[0030] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. Throughout the drawings, similar elements are denoted by like reference numerals, and descriptions thereof will not be repeated.
[0031] Figure 1A and Figure 1B to Figure 3A and Figure 3B is to show the method of manufacturing the semiconductor device according to the first embodiment. A method of manufacturing a semiconductor device includes the following procedures. First, a plurality of electrode pads 130 are formed on the substrate 100 . Next, the protective insulating film 120 is formed at the plurality of electrode pads 13...
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