Method and device for detecting wafer surface defects
A detection method and defect technology, applied in the direction of measuring devices, optical devices, semiconductor/solid-state device testing/measurement, etc., can solve problems such as inaccurate positioning, inability to locate chips, unfavorable analysis, etc.
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[0029] It can be seen from the background technology that an existing detection device for detecting defects on the surface of a wafer uses a test tape (die by die) comparison method to detect defects. However, the usual size of a test tape can be one chip (chip) The area where the chip is located or the area where multiple chips are located, or an exposure area (BLOCK), the result file generated by the detection corresponds to the defined test zone, so that the position of the defect in the test zone can be located. However, when the above-mentioned equipment is used for inspection, the size of the test strip should not be less than 2mm×2mm. Therefore, when the size of the chip is smaller than 2mm, one test strip will include the area where multiple chips are located, so that the equipment cannot accurately locate the defect. The position in the chip, so that the chip with the defect cannot be located, so it is not conducive to analyzing the cause of the defect.
[0030] Ther...
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