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Diffusion plate structure and manufacturing method thereof

A manufacturing method and diffusion plate technology, which is applied in the field of diffusion plates, can solve the problems of cost increase and expensive price, etc.

Active Publication Date: 2014-11-05
GLOBAL MATERIAL SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above situation has been well known in the LCD panel industry for a long time, but it cannot be effectively solved
Furthermore, the size of the liquid crystal panel is increasing day by day, so is the size of the diffuser plate 12, and the price is expensive. If the self-cleaning (Self-Clean) is implemented every time and a new product is replaced, the cost will inevitably increase significantly.

Method used

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  • Diffusion plate structure and manufacturing method thereof
  • Diffusion plate structure and manufacturing method thereof
  • Diffusion plate structure and manufacturing method thereof

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Embodiment Construction

[0015] The specific implementation of the diffuser plate structure and its manufacturing method provided by the present invention will be described in detail below in conjunction with the accompanying drawings.

[0016] Please also refer to the attached figure 2 and attached image 3 , with figure 2 Shown is a three-dimensional schematic diagram of a diffuser plate structure 200 drawn according to an embodiment of the present invention, with image 3 shown is attached figure 2 Sectional view along line AA'. The diffusion plate structure 200 includes a substrate 210 , a plurality of holes 220 and an adhesive layer 230 . Holes 220 are longitudinally formed in the base material 210, that is, through the upper and lower surfaces of the base material 210. Each hole 220 includes an air inlet portion 222, an air outlet portion 224, and a connecting portion 226. The connecting portion 226 is used to connect the air inlet portion. 222 and the outlet part 224. The adhesive laye...

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Abstract

The invention relates to a diffusion plate structure and a manufacturing method. The diffusion plate structure comprises a substrate, a plurality of holes and a bonding layer, wherein the plurality of holes are formed in the substrate longitudinally; each hole respectively comprises an air inlet part, an air outlet part and a connecting part used for connecting the air inlet part and the air outlet part; the bonding layer is formed on the side wall of each air outlet part; and the thickness of the bonding layer is between 1 micron and 11 microns. The diffusion plate structure can solve the problem that fine particles are generated periodically after a self-cleaning function is implemented by plasma auxiliary chemical vapor deposition equipment.

Description

【Technical field】 [0001] The invention relates to a diffuser plate, in particular to a diffuser plate structure capable of avoiding periodic generation of tiny particles (Particles) in plasma-assisted chemical vapor deposition equipment and a manufacturing method thereof. 【Background technique】 [0002] In the process of liquid crystal display devices, a large number of devices such as thin film transistors (Thin Film Transistor, TFT) must be fabricated on the glass substrate first, please refer to the attached figure 1 As shown, it is a schematic diagram of a glass substrate 10 in a chamber 1 of a plasma-enhanced chemical vapor deposition (Plasma-Enhanced Chemical Vapor Deposition, PECVD) reaction chamber. In the plasma-assisted chemical vapor deposition reaction chamber cavity 1, the diffusion plate (Diffuser) 12 is used as the upper electrode, and the heater (Susceptor) 14 is used as the lower electrode, wherein the diffusion plate 12 has a plurality of holes (not shown) ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00C23C16/513
Inventor 朴炳俊苏金种刘芳钰
Owner GLOBAL MATERIAL SCI