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Focusing and levelling measuring device

A measuring device, focusing and leveling technology, applied in the direction of optics, instruments, photoplate making process of pattern surface, etc., can solve the problems of low resolution, small compensation range, large aberration, etc., and achieve the effect of ensuring the image quality

Active Publication Date: 2014-05-21
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, the larger the rotation angle of the offset plate, the larger the compensation range, but the larger the aberration caused, the worse the imaging quality and the lower the resolution
Therefore, in order to ensure the imaging quality, the rotation of the offset plate can only be limited to a certain small angle, and the compensation range is relatively small, otherwise the resolution will not meet the requirements

Method used

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  • Focusing and levelling measuring device
  • Focusing and levelling measuring device
  • Focusing and levelling measuring device

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Embodiment Construction

[0023] In order to make the purpose and features of the present invention more comprehensible, the specific implementation manners of the present invention will be further described below in conjunction with the accompanying drawings.

[0024] It has been mentioned in the background technology that the existing focusing and leveling measurement device uses the rotation of an offset plate to compensate the drift of the focal plane of the projection objective lens. However, the rotation of the offset plate causes certain aberrations and reduces the imaging quality. , which limits the range of rotation of the offset plate, which in turn limits the range of compensation.

[0025] The core idea of ​​the present invention is that a first offset plate and a second offset plate are arranged on the measurement optical path on either side, and the first offset plate is rotated by a first angle around the first coordinate axis to compensate the drift of the focal plane of the projection o...

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Abstract

The invention discloses a focusing and levelling measuring device. In the device, a first offset flat plate and a second offset flat plate are arranged on a measuring optical path on any one side; the first offset flat plate rotates a first angle around a first coordinate axis to compensate for the drift of a focal surface of a projection objective; and the second offset flat plate rotates a second angle and a third angle respectively around a second coordinate axis and a third coordinate axis to compensate for aberration caused by the rotation of the first offset flat plate, so that the drift of the focal surface of the projection objective can be compensated within large range while the imaging quality can be ensured.

Description

technical field [0001] The invention relates to the technical field of silicon semiconductor technology, in particular to a focusing and leveling measurement device. Background technique [0002] In a projection lithography apparatus, a focusing and leveling measuring device is usually arranged between a projection objective lens and a substrate (eg, a silicon wafer) to obtain topographic information of the substrate surface, such as height and inclination of a specific region. Focusing and leveling measurement devices usually use non-contact measurements such as optical measurement methods, and require high precision. [0003] However, when the focal plane of the projection objective lens drifts, the center of the measurement point of the focusing and leveling measurement device will not coincide with the exposure field of view of the projection objective lens, causing measurement errors. figure 1 It is a schematic diagram of the principle of measurement error caused by th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F9/00
Inventor 卢丽荣李志丹陈飞彪
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD