Feedforward temperature control method for cleaning liquid
A temperature control method and liquid medicine technology, applied in temperature control, non-electric variable control, control/regulation system, etc., can solve the problems of slow response speed, non-recommended use of differential, long process response time of temperature, etc.
Active Publication Date: 2011-08-10
BEIJING SEVENSTAR ELECTRONICS CO LTD
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Problems solved by technology
The functions of P and I are both to correct the result, but the response speed is slow, which may affect the rapid initial process of the equipment, and the differential D has a leading effect, which can eliminate this shortcoming, but the differential D may amplify the interference of the system , and due to the long process response time of temperature, it is not recommended to use differential
Such a temperature control method only controls the temperature of the liquid storage tank TANK or the measuring point at the outlet of the liquid supply by changing the heating power of the heater HEATER, but since the system only has one control loop, it has a huge hysteresis and it is difficult to overcome the The recovery of -250 liquid medicine and the disturbance caused by various factors in the pipeline
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[0067] In order to make the purpose, content, and advantages of the present invention clearer, the specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments.
[0068] In the cleaning liquid supply process, in order to improve the anti-disturbance ability of the liquid temperature control method, the specific embodiment of the present invention is preferably a feed-forward-cascade temperature control method for cleaning liquid, the feed-forward-cascade temperature control method The method involves a chemical liquid delivery system including a chemical liquid storage tank TANK, a heater HEATER and a filter FILTER, that is, a CDS system, such as image 3 As shown, the CDS system supplies the cleaning solution to the cleaning target equipment through the process cleaning liquid supply outlet. After the liquid medicine is heated by the heater HEATER from the liquid medicine stora...
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The invention relates to a feedforward-cascade temperature control method for cleaning liquid, belonging to the technical field of automatic control. To improve the disturbance resistance capacity of liquid, the method comprises the steps of: arranging a first temperature sensor and a feedforward controller at the bottom of a liquid storage tank, arranging a second temperature sensor at the outlet of a heater, and arranging a third temperature sensor at the outlet of liquid feed for process cleaning; controlling the heater to heat up the liquid storage tank to enable the liquid temperature inthe storage tank to reach a target temperature value; supplying the cleaning liquid after the liquid temperature reaches the target temperature value and becomes stable, and at the same time controlling the heating power of the heater to steadily maintain the liquid feed temperature at the liquid feed target temperature value. The method can effectively overcome the disturbance of liquid feed temperature at the outlet of liquid feed resulting from the recovery or replacement of the cleaning liquid and can effectively overcome the influence of flow fluctuation on liquid temperature at the outlet of the heater due to the factors such as changes in pipeline pressure.
Description
technical field [0001] The invention relates to the technical field of automatic control, in particular to a feedforward temperature control method for cleaning liquid. Background technique [0002] Cleaning is an essential process in the manufacturing process of integrated circuits. The main purpose of cleaning is to remove pollution and impurities on the surface of silicon wafers. At present, 65nm cleaning technology has become a key technology in the integrated circuit manufacturing industry. In the cleaning process, the temperature of the chemical liquid is a key parameter of the cleaning process, which directly affects the cleaning effect of silicon wafers. Therefore, the temperature control of the chemical solution is an important technical problem to be solved in the cleaning process. [0003] Chemical delivery system (Chemical Delivery System-CDS) is the liquid supply system of the cleaning equipment, which provides N to the silicon wafer cleaning process. 2 , clea...
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Inventor 李春彦李曼韩雷刚裴立坤昝威
Owner BEIJING SEVENSTAR ELECTRONICS CO LTD