Cleaning device and coating device for slit nozzle
A slit nozzle and cleaning device technology, which is applied to spraying devices, spraying devices, and devices for coating liquid on surfaces, etc., can solve the problems of low cleaning efficiency, many particles, and time-consuming, so as to suppress the generation of particles. Effect
Active Publication Date: 2011-08-24
TOKYO ELECTRON LTD
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- Application Information
AI Technical Summary
Problems solved by technology
However, the slit gap of this type of slit nozzle is generally an extremely fine gap of 100 μm or less as described above, and it is very troublesome and laborious to insert a thin plate into the gap and clean it. The main reasons for the maintainability of cladding equipment or the decrease in operating rate
In addition, due to the inefficient and time-consuming cleaning operation, it also results in more particles scattered around during the operation
Method used
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Embodiment Construction
[0041] Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.
[0042] figure 1 A configuration example of a resist liquid coating device to which the slit nozzle cleaning device of the present invention can be applied is shown.
[0043] This non-spin coating coating device has: a floating table 10 for floating a substrate to be processed, such as a glass substrate G for FPD, in the air by the pressure of gas, and a floating table 10 for floating on the floating table 10 along the length direction of the floating table ( X direction) the substrate transport mechanism 20 for transporting the substrate G floating in the air, the slit nozzle 32 for supplying the resist solution to the upper surface of the substrate G transported on the floating table 10, the The nozzle regeneration unit 42 that regenerates the slit nozzle 32 during the interval.
[0044] The upper surface of the floating table 10 is provided with a plurality of gas...
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The invention provides a cleaning device and a coating device for a slit nozzle, the cleaning device and the coating device are capable of automatically and efficiently cleaning slit inner of a slit nozzle when inhibiting generation of particles. The cleaning device for a slit nozzle (70) comprises: a nozzle cleaning unit (56), an X-direction moving part (54) used for making a whole startup filling processing part move on a substrate conveying direction (X direction), and a Y-direction part (60) used for making the nozzle cleaning unit move in a nozzle length direction (Y direction) in a housing (44). The nozzle cleaning unit (56) comprises: a thin-plate scraper blade (74) capable of being inserted from the outside to a slit (32a) of a slit nozzle (32) or being pulled from the inner of the slit (32a), a lifting mechanism (78) used for making the scraper blade and a maintenance part (76) integratedly move in a spray-out direction of the slit nozzle, and a rotating mechanism (82) used for making the scraper blade rotate.
Description
Technical field [0001] The present invention relates to a coating device of a non-spin coating method, in particular to a slit nozzle cleaning device used in a coating process of a non-spin coating method for cleaning the inside of the slit of the slit nozzle. Background technique [0002] In the lithography process in the manufacturing process of flat panel displays (FPD) such as LCDs, the following non-spin coating method is widely used: the elongated slit nozzle with the slit-shaped ejection port is opposed to The substrate to be processed such as a glass substrate moves relatively, and a coating liquid such as a processing liquid or a chemical liquid, for example, a resist liquid, is applied to the substrate. [0003] In a typical non-spin coating method, while spraying the resist liquid from the slit nozzle in a strip shape with respect to the substrate fixed and placed on the table, the slit nozzle is aligned along the direction perpendicular to the nozzle length direction. ...
Claims
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Login to View More IPC IPC(8): B05B15/02B05C5/02
CPCB05B1/044B05B15/52B05C11/10B05C21/00
Inventor 元田公男宫崎文宏太田义治川内拓男
Owner TOKYO ELECTRON LTD