Polarizing element and manufacturing method thereof
A polarizing element and polarizing film technology, applied in optical elements, polarizing elements, optics, etc., can solve problems such as loss of polarizing effect of polarizing elements, humidity requirements of polarizing elements, inability to uniform polarization absorption characteristics of electromagnetic waves, etc., and achieve uniform polarization absorption performance, Wide due range of effects
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[0020] see figure 2 , the preparation method of the polarizing element 10 according to the embodiment of the present invention mainly includes the following steps:
[0021] Step 1: providing a carbon nanotube array, preferably, the array is a super-aligned carbon nanotube array.
[0022] In this embodiment, the preparation method of the super-parallel carbon nanotube array adopts the chemical vapor deposition method, and its specific steps include: (a) providing a flat substrate, which can be a P-type or N-type silicon substrate, or a silicon substrate formed with The silicon base of oxide layer, present embodiment preferably adopts the silicon base of 4 inches; (b) uniformly form a catalyst layer on the base surface, this catalyst layer material can be selected iron (Fe), cobalt (Co), nickel (Ni) or one of alloys in any combination thereof; (c) annealing the above-mentioned substrate formed with a catalyst layer in air at 700-900° C. for about 30 minutes to 90 minutes; (d) ...
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