Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for evaluating and filtering noise of space images of photoetching machine

A space image and lithography machine technology, which is applied in the direction of microlithography exposure equipment, photolithography exposure equipment, etc., can solve problems such as pollution, Zernike aberration repeatability difficult to meet engineering requirements, etc.

Active Publication Date: 2012-11-14
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Shanghai Microelectronics Equipment Co., Ltd. proposed a method of measuring wave aberration with an aerial image model (prior technology 3, Anatoly Y.Burov, LiangLi, Zhiyong Yang, Fan Wang, Lifeng Duan, "Aerial image model and application to aberrationmeasurement", Proc.SPIE 7640, 764032 (2010)), this method generates a large number of spatial images by designing a combination of Zernike coefficients to form a set of spatial images, and performs principal component analysis on this set of spatial images, thus establishing the A linear model between the spatial image and the Zernike coefficient. In the simulation experiment, this method can obtain the Zernike aberration very well, but in engineering applications, because the spatial image is polluted by noise during the measurement process, the Zernike aberration The repetition accuracy of aberration solution is difficult to meet the engineering requirements, which requires evaluating the noise source, noise distribution and intensity of the aerial image, and designing a filtering method to filter out the influence of measurement noise on the Zernike aberration solution results as much as possible

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for evaluating and filtering noise of space images of photoetching machine
  • Method for evaluating and filtering noise of space images of photoetching machine
  • Method for evaluating and filtering noise of space images of photoetching machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0046] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.

[0047] see first figure 1 , figure 1 It is a structural schematic diagram of the aerial image noise evaluation system adopted in the present invention. Depend on figure 1 It can be seen that the spatial image noise evaluation system adopted in the present invention includes a light source 1 that generates an illumination beam, an illumination system 2 that adjusts the light beam emitted by the light source, a test mask 4, a mask table 5 that carries the test mask 4 and can be positioned accurately, The test mark 3 on the test mask, the projection objective lens 6 for performing aerial image imaging on the test mark 3, the six-dimensional scanning workpiece table 8 capable of precise positioning, and the aerial image sensor 7 installed on the six-dimensional scanning workp...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
widthaaaaaaaaaa
Login to View More

Abstract

The invention relates to a method for evaluating and filtering the noise of space images of a photoetching machine, comprising the following steps of: acquiring the space images of tested marks; establishing the standard difference of the noise of the space images and the ideal light intensity of the space images; carrying out analysis of main components on the standard difference of the noise ofthe space images; and utilizing the best smooth factor to carry out two-dimensional sample band smooth filtering on the space images and obtaining the space images in which noise is filtered. In the method, the noise of the space image is simply and conveniently filtered, and the solving accuracy and the solving repeatability based on solving wave aberration of the space image are improved.

Description

technical field [0001] The invention relates to the wave aberration of the projected objective lens of a lithography machine, in particular to a method for evaluating and filtering the spatial image noise of a lithography machine. Background technique [0002] The projection objective lens is one of the core components of the lithography machine system. Projection objective lens wave aberration is an important index affecting the performance of step and scan projection lithography machine, which can be characterized by Zernike polynomial and its coefficients. Wave aberration directly affects lithography technical indicators such as imaging quality, lithography resolution, and critical dimension (CD) uniformity of the lithography machine. Therefore, the wave aberration of the projection objective lens is one of the most critical detection indicators in the lithography machine. As the feature size of lithography continues to decrease, the aberration tolerance of the projectio...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 徐东波王向朝彭勃闫观勇段立峰
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com