Flower bed construction and flower planting method in heavy saline-alkali land in arid area
A planting method and saline-alkali land technology, which is applied in the field of soil improvement and green lawn planting, can solve the problems of cumbersome irrigation and drainage construction, excessive water resources, and high loss rate of farmland land use, and achieve the effect of low cost and high benefit for soil improvement
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0049] Example 1: see figure 1 , figure 2 , image 3 , a method for constructing flower beds and planting flowers in heavy saline-alkali land in arid areas, comprising the following steps:
[0050] (1) Excavation of foundation pit: According to the size and shape of the green area, excavate a foundation pit with a depth of 20-40cm on the ground;
[0051] (2) Lining film: According to the size and shape of the green area, lay polyethylene plastic film on the ground to isolate alkali;
[0052] (3) Build separation walls around: build concrete retaining brick walls 50cm-60cm above the ground around the foundation pit;
[0053] (4) Drainage ditches: Excavate drainage ditches on the outside of the retaining wall on the lower side of the green space to communicate with the sewers;
[0054](5) Drain holes: at the base of the retaining wall on the lower side of the green land, open at least one hole leading to the drainage ditch every 5-10m, the diameter of the hole is 5-10cm, a...
Embodiment 2
[0070] Embodiment 2: Same as Embodiment 1, except that step (12) is not performed.
Embodiment 3
[0071] Embodiment 3: the same as Embodiment 1, the difference is: step (2), step (4), step (5), step (6), and step (7) are not performed.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com