Process control method of multi-process machine table
A control method and multi-process technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of single-process control method and difficulty in further improving WPH, and achieve the effect of improving WPH and increasing the number of treatments
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[0025] The main flow of the multi-process machine process control method provided by the embodiment of the present invention is as follows:
[0026] Step 1, select the bottleneck process of the multi-process machine;
[0027] Step 2, increase the waiting time of the non-bottleneck process that shares the handling equipment with the bottleneck process, preferably, the increased waiting time satisfies condition 1) and condition 2):
[0028] Condition 1) The increased waiting time is less than the time difference between the time when the wafer is transported to the bottleneck process and the time when the non-bottleneck process is completed, and greater than the time difference between the time when the wafer unloading of the bottleneck process is completed and the time when the non-bottleneck process is completed.
[0029] Condition 2) The increased waiting time is greater than the time difference between the processing completion time of the preceding process of the bottleneck...
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