Well-type neurochip and preparation method thereof
A neural chip and nerve technology, applied in instruments, measuring devices, scientific instruments, etc., can solve the problems of small amplitude, distance and complex shape of electrical signals
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Embodiment 1
[0026] The well type neural chip of the present embodiment is made up of chip unit and a bottomless culture cavity (such as figure 1 shown). The chip unit is composed of a substrate, metal leads, microelectrodes, insulating layers and nerve wells; the substrate is glass; the metal leads are gold; there is a microelectrode array on the substrate, and the diameter of the microelectrodes is 50 μm. The quantity is 16, the distance between micro-electrodes is 500 μm, the surface of micro-electrodes is treated with platinum black, and the insulating layer is SiO 2 and Si 3 N 4 Each nerve well corresponds to a microelectrode; the wall of the nerve well is composed of chitosan porous network with a porosity greater than 90% and a pore size of 5 μm.
[0027] The preparation method of the well type neural chip is carried out according to the following steps:
[0028] 1) Preparation of the chip unit of the microelectrode array device
[0029] (1) SiO used 2 The base is cleaned;
...
Embodiment 2
[0045] The well-shaped neural chip of this embodiment is composed of a chip unit and a bottomless culture chamber. The chip unit is composed of a substrate, metal leads, microelectrodes, insulating layers and nerve wells; the substrate is glass; the metal leads are gold; there is a microelectrode array on the substrate, the diameter of the microelectrode is 30 μm, the microelectrode array is a lattice, and the microelectrode The quantity is 32, the distance between micro-electrodes is 300 μm, the surface of micro-electrodes is treated with platinum black, and the insulating layer is SiO 2 and Si 3 N 4 Each nerve well corresponds to a microelectrode; the wall of the nerve well is composed of chitosan porous network with a porosity greater than 90% and a pore size of 3 μm.
[0046] The preparation method of the well type neural chip is carried out according to the following steps:
[0047] 1) Preparation of the chip unit of the microelectrode array device
[0048] (1) SiO used...
Embodiment 3
[0064] The well-shaped neural chip of this embodiment is composed of a chip unit and a bottomless culture chamber. The chip unit is composed of a substrate, metal leads, microelectrodes, insulating layers and nerve wells; the substrate is glass; the metal leads are gold; there is a microelectrode array on the substrate, the diameter of the microelectrode is 30 μm, the microelectrode array is a lattice, and the microelectrode The quantity is 19, the distance between microelectrodes is 200μm, the surface of microelectrodes is treated with platinum black, and the insulating layer is SiO 2 and Si 3 N 4 Each nerve well corresponds to a microelectrode; the wall of the nerve well is composed of chitosan porous network with a porosity greater than 90% and a pore size of 4 μm.
[0065] The preparation method of the well type neural chip is carried out according to the following steps:
[0066] 1) Preparation of the chip unit of the microelectrode array device
[0067] (1) SiO used ...
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Abstract
Description
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