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Device and method used for preparing transparent conducting film of thin film solar cell

A transparent conductive film, solar cell technology, applied in circuits, discharge tubes, electrical components, etc., can solve the problems of long deposition time, long manufacturing time, complex equipment, etc., and achieve simple structure, uniform coating, high conductivity of equipment Effect

Active Publication Date: 2013-12-11
SHEN ZHEN TRONY SCI & TECH DEV CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Chinese patent 200910112948.5 "A Method for Improving the Conductivity and Stability of Aluminum-doped ZnO Transparent Conductive Film AZO" prepares the conductive film off-line, and anneals the sputtered aluminum-doped ZnO with special annealing equipment to obtain stable and low-resistance AZO Film layer, this method requires a lot of equipment investment, long manufacturing time, and high production cost; while Chinese patent 200910089144.8 "Preparation Method of a Transparent Conductive Film" discloses a method for preparing a transparent conductive film by online continuous low-temperature sputtering, but still There are disadvantages such as complex equipment, high cost, cumbersome manufacturing process, and long deposition time, so it is not suitable for industrial production
Moreover, in the prior art, in the process of vacuum magnetron sputtering AZO target material, when positive ions such as argon ions bombard the target material, neutral atoms such as Al, Zn, O, etc. will be bombarded, and these neutral atoms will move to the substrate. The surface of the sheet is combined with each other and deposited to form a film; at the same time, a certain amount of negative oxygen ions will be generated during the sputtering target. These negative oxygen ions directly bombard the deposited film under the acceleration of the cathode target, which will cause a lot of damage to the film. damage, forming defects such as dislocations and holes, thereby reducing the conductivity of the film layer

Method used

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  • Device and method used for preparing transparent conducting film of thin film solar cell
  • Device and method used for preparing transparent conducting film of thin film solar cell
  • Device and method used for preparing transparent conducting film of thin film solar cell

Examples

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Effect test

Embodiment 1

[0029] In this embodiment, the AZO film layer is sputtered and plated on the back electrode of the substrate 101. The coating manufacturing equipment includes a vacuum chamber 104, a sputtering target 105, an anode device 107 and a substrate holder 106, and the substrate 101 is placed on the substrate holder 106. Above, the anode device 107 includes an anode rod 107-1, a plugging wire 107-2, and an air diffuser 107-3. The anode rod 107-1 is a stainless steel round tube with small holes with internal threads on the side, and the air diffuser 107- 3 includes a head 107-3-1 and a shank 107-3-2, the shank 107-3-1 has an external thread, and the hole distribution of the head 107-3-1 is as follows Figure 5 As shown, the handle 107-3-2 cooperates with the internal thread of the small hole on the side of the anode rod 107-1 and is installed on the anode rod 107-1, and the plugging wire 107-2 is tightened on the top of the anode rod 107-1, and the anode rod 107 -1 is fixed on the vacu...

Embodiment 2

[0039]The difference between this embodiment and Embodiment 1 is that the small hole on the side of the anode rod 107-1 of this embodiment is a light hole, the outer surface of the handle 107-3-2 of the airflow diffuser 107-3 is a smooth surface, and the handle 107-3-2 is a smooth surface. 3-2 is closely matched with the light hole, and the hole distribution of the head 107-3-1 of the air diffuser 107-3 is as follows Figure 7 As shown, the vacuum chamber 104 is grounded, the sputtering target 105 is aluminum-doped zinc oxide, the potential U1 is -300V, the substrate 101 is placed on the substrate holder 106, the potential U2 is -15V, and the potential U3 of the anode device 107 is - 5V. Others are the same as in Embodiment 1. According to this manufacturing process, the final film resistivity is 4.2×10 -4 Ω.cm.

Embodiment 3

[0041] In this embodiment, the vacuum chamber 104 is grounded, the sputtering target 105 is aluminum-doped zinc oxide, the potential U1 is -100V, the substrate 101 is placed on the substrate holder 106, the potential U2 is -5V, and the potential U3 of the anode device 107 is 5V . Others are the same as in Embodiment 1. According to this manufacturing process, the final film resistivity can reach 3.32×10 -4 Ω.cm.

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Abstract

The invention relates to a device and a method used for preparing a transparent conducting film of a thin film solar cell, which belong to the technical field of thin film solar cells, and solve the problem of preparation of the transparent conducting film with high conductivity in a low temperature sedimentary condition. The device comprises a vacuum cavity, a sputtering target, a substrate frame and a power supply, wherein the sputtering target and the substrate frame are arranged in the vacuum cavity; and the device is characterized in that an anode device is arranged between the sputtering target and the substrate frame, and the electric potential of the anode device is larger or equal to that of the substrate frame. The invention overcomes the defects that film layers are staggered and have cavities, and the like of the traditional technology and device, the electrical resistivity of the film layer is reduced to be a magnitude grade of 10-4omega.cm, and the transparent conducting film with high conductivity can be realized in low temperature sedimentary.

Description

technical field [0001] The invention relates to a device and a method for manufacturing a transparent conductive film of a thin-film solar cell, in particular to a manufacturing device and a process for depositing a transparent conductive film of an amorphous silicon thin-film solar cell, belonging to the technical field of solar thin-film cells. Background technique [0002] The manufacturing process of the front electrode and the back electrode of the thin-film solar cell needs to be plated with TCO film layer. The TCO film layer is a transparent conductive film, which is used as a conductive electrode and can transmit light at the same time. The higher the transmittance of the TCO film, the more light enters the battery, and the greater the short-circuit current and open-circuit voltage of the battery, that is, increasing the conductivity of the TCO film can reduce the defects of the TCO film and reduce the battery life. Therefore, how to prepare a TCO film with high tran...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32H01J37/34H01L31/18
CPCY02P70/50
Inventor 刘志斌李毅宋光耀
Owner SHEN ZHEN TRONY SCI & TECH DEV CO LTD