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Longitudinal Type Heat Treatment Apparatus And Control Method Thereof

A technology of heat treatment device and control method, which is applied in the direction of waste heat treatment, furnace type, lighting and heating equipment, etc., can solve the problems of long convergence time, achieve the effects of shortening convergence time, increasing production capacity, and realizing power consumption

Inactive Publication Date: 2012-04-04
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This problem of long convergence time is not only a problem in the process of heating up but also in the process of cooling down or when the temperature is stable.

Method used

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  • Longitudinal Type Heat Treatment Apparatus And Control Method Thereof
  • Longitudinal Type Heat Treatment Apparatus And Control Method Thereof
  • Longitudinal Type Heat Treatment Apparatus And Control Method Thereof

Examples

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no. 1 Embodiment approach

[0037] Next, a first embodiment of the present invention will be described with reference to the drawings. here figure 1 (a) is a longitudinal sectional view schematically showing the heat treatment apparatus of the present invention, figure 1 (b) is a diagram showing a control device for a heat treatment device, figure 2 It is a figure showing the coolant supply line and the coolant exhaust line of a vertical heat treatment apparatus, image 3 (a), (b), and (c) are diagrams showing the control method of the heat treatment device, Figure 4 It is a figure which shows the control method of a heat treatment apparatus.

[0038] exist figure 1 Among them, a vertical heat treatment apparatus 1 includes a vertical heat treatment furnace 2 capable of accommodating a plurality of objects to be processed at a time, such as semiconductor wafers w, and performing heat treatments such as oxidation, diffusion, and reduced-pressure CVD. This heat treatment furnace 2 is provided wit...

no. 2 Embodiment approach

[0096] then pass Figure 5 A second embodiment of the present invention will be described.

[0097] Figure 5 The second embodiment shown is only different in the structure of the control device 51, and the other structures are the same as Figure 1 to Figure 4 The first embodiment shown is substantially the same.

[0098] exist Figure 5 In the second embodiment shown, for the Figure 1 to Figure 4 The same parts as in the first embodiment shown are given the same symbols, and detailed descriptions are omitted.

[0099] Such as Figure 5 As shown, the control device 15 has: a heater output calculation unit 51a, which determines the temperature at which only the heater 18A is used based on the set temperature determined in advance in the set temperature determination unit 51c and the temperature in the furnace from the temperature sensor 50. heater output during adjustment; and a blower output calculation unit (cooling output calculation unit) 51b that determines blower ...

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PUM

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Abstract

Provided is a longitudinal type heat treatment apparatus and a control method thereof. The heat treatment apparatus (1) comprises a furnace body (5), a heater (18A) arranged at the inner circumference of the furnace body (5), a processing container (3) arranged in the furnace body (5), a cooling medium supply blower (53) connected with the furnace body (5), a cooling medium venting blower (63), and a temperature sensor (50) arranged in the processing container (3), wherein the signals from the temperature sensor (50) are sent to the heater output operating portion (51a) of a control apparatus (51); the heater output can be figured out when only the heater (18A) is employed for temperature adjustment, according to the set temperature (A) calculated by a set temperature determining portion (51C) and the temperature from the temperature sensor (50); and the blower output operating portion (51b) produces blower output according to the heater output.

Description

technical field [0001] The invention relates to a vertical heat treatment device and a control method thereof. Background technique [0002] In the manufacture of semiconductor devices, various heat treatment apparatuses are used to perform heat treatments such as oxidation, diffusion, CVD, and annealing on a target object such as a semiconductor wafer. As one of them, there is known a vertical heat treatment apparatus capable of heat treating a plurality of sheets at a time. This vertical heat treatment apparatus includes: a processing container made of quartz, which has an opening in the lower part; a cover, which opens and closes the opening of the processing container; a plurality of objects to be processed are held at intervals; and a furnace body is provided around the processing container and includes a heater for heating the object to be processed carried in the processing container. [0003] In addition, as a vertical heat treatment apparatus, a device equipped wi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00F27D17/00
CPCF27B17/0025H01L21/67109H01L21/67248
Inventor 吉井弘治山口达也王文凌斋藤孝规
Owner TOKYO ELECTRON LTD