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Double-layer crucible used for Czochralski silicon single crystal growth

A double-layer crucible, Czochralski technology, applied in the direction of single crystal growth, crystal growth, self-melting liquid pulling method, etc., can solve the problems of large equipment investment, electromagnetic field consumption, etc., to reduce oxygen concentration and improve temperature stability , the effect of reducing the erosion rate

Inactive Publication Date: 2012-04-11
曾泽斌
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the electromagnetic field consumes a lot o

Method used

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  • Double-layer crucible used for Czochralski silicon single crystal growth
  • Double-layer crucible used for Czochralski silicon single crystal growth
  • Double-layer crucible used for Czochralski silicon single crystal growth

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Example Embodiment

[0012] like figure 1 As shown, the double-layer crucible used for the growth of Czochralski silicon single crystal includes a crucible 24, an inner crucible ring 23, and a liquid flow hole 25. The crucible 24 is provided with a crucible inner ring 23 in the center, and the lower end of the crucible inner ring 23 is connected to the bottom of the crucible 24. Four symmetrically distributed liquid flow holes 25 are arranged at the contact point, the diameter of the flow liquid holes 25 is 10-20 mm, the crucible inner ring 23 is coaxial with the crucible 24, and the wall thickness of the crucible 24 and the crucible inner ring 23 is 8-12 mm, The ratio of the outer diameter d of the crucible inner ring 23 to the outer diameter D of the crucible 24 is 0.5-0.7, and the height h of the crucible inner ring 23 2 Height h with crucible 24 1 The ratio is 0.6 to 0.8.

[0013] The materials of the crucible 24 and the crucible inner ring 23 are quartz glass, silicon nitride ceramics or si...

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Abstract

The invention discloses a double-layer crucible used for Czochralski silicon single crystal growth. The double-layer crucible comprises a crucible, a crucible inner ring and dog-holes, wherein the crucible inner ring is arranged at the center inside the crucible, four symmetrically distributed dog-holes are arranged at the contact position of the lower end of the crucible inner ring and the bottom of the crucible, the diameter of the dog-holes is 10-20 mm, the crucible inner ring is coaxial to the crucible, the thickness of the walls of the crucible and the crucible inner ring is 8-12 mm, the ratio of the outside diameter d of the crucible inner ring to the outside diameter D of the crucible is 0.5-0.7, and the ratio of the height h2 of the crucible inner ring to the height h1 of the crucible is 0.6-0.8; and the crucible and crucible inner ring are made from the material of quartz glass, silicon nitride ceramic or silicon carbide ceramic. The double-layer crucible can effectively inhibit heat convection of silicon melt in a silicon single crystal growth process, substitutes for the action of an electromagnetic field, is simple and energy-saving, and can effectively reduce erosion speed of a quartz crucible, improve temperature stability of the center region on the surface of the silicon melt, and reduce oxygen concentration in silicon single crystal.

Description

technical field [0001] The invention relates to the growth of Czochralski silicon single crystal, in particular to a double-layer crucible for the growth of Czochralski silicon single crystal. Background technique [0002] The Czochralski silicon single crystal growth furnace needs to use a quartz crucible to melt polycrystalline silicon. Usually, a quartz crucible is selected according to the diameter of the silicon single crystal to be grown. Now the commonly used outer diameters are 18 inches, 20 inches, 22 inches, 24 inches, and 28 inches. inch, 32 inch quartz crucible. The shape of the quartz crucible is a cylinder with an open top and a bottom bottom. [0003] When growing a silicon single crystal in a Czochralski silicon single crystal furnace, there is heat convection of the melt in the quartz crucible, and the heat convection rises along the crucible wall and flows to the central area of ​​the crucible under the surface of the melt. Thermal convection has a strong...

Claims

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Application Information

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IPC IPC(8): C30B15/10
Inventor 曾泽斌
Owner 曾泽斌
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