Monitoring method of environmental magnetic shield of electronic scanning microscope

An environmental magnetic field, electronic scanning technology, applied in scanning probe technology, instruments, etc., can solve the problem of inability to effectively monitor the occasional environmental magnetic field, and achieve the effect of avoiding misjudgment

Active Publication Date: 2012-05-09
SHANGHAI HUALI MICROELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The technical effect that this technology improves over previous methods by dynamically measuring measurements without mistakenly identifying any errors or taking into account factors like temperature fluctuations during manufacture. This helps improve accuracy when determining how well an electronic device needs maintenance based on its performance level.

Problems solved by technology

Technological Problem: Current techniques used by modern electronic devices require precise measurements with respect to both static (no moving) environments such as air currents caused by sunlight exposure during production, which may cause errors if they are mistaken due to these factors. Additionally, current solutions only provide limited ability to detect changes over short periods of time without being able to accurately track any significant sources of magnetism outside this range.

Method used

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  • Monitoring method of environmental magnetic shield of electronic scanning microscope
  • Monitoring method of environmental magnetic shield of electronic scanning microscope
  • Monitoring method of environmental magnetic shield of electronic scanning microscope

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Embodiment Construction

[0029] The present invention will be further described below in combination with principle diagrams and specific operation examples.

[0030] Such as figure 1 , figure 2 Shown, the monitoring method of a kind of electron scanning microscope environmental magnetic field of the present invention, wherein, comprise the following steps:

[0031] Step 1: Scanning a silicon wafer with an electron scanning microscope to obtain a line pattern of the silicon wafer.

[0032] In this step, the selected line pattern can be any photoresist line pattern after polishing and development that needs to be measured, and can also be the substrate line pattern after etching.

[0033] Step 2: Select one side of one of the graphs 1 in the line graph, select multiple measurement points 2 and obtain the measurement data, and measure the point 3 corresponding to the measurement point on the other side of the line graph data collection.

[0034] In the implementation, the measurement data of each m...

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Abstract

The invention discloses a monitoring method of an environmental magnetic shield of an electronic scanning microscope, and the monitoring method comprises the following steps that a line drawing of a silicon wafer to be measured is selected; a plurality of measuring points are selected on one side of the line drawing, measuring data of the measuring points are collected, and measuring data of relative points of the measuring points are collected on the other side of the line drawing; first difference values among the measuring data of corresponding points on the two sides of the line drawing are calculated; the maximum difference value and the minimum difference value among the first difference values are obtained, and a second difference value between the maximum difference value and the minimum difference value is calculated and is used as a measuring result; the measuring result is recorded in an environmental magnetic shield influence control chart; and according to the measuring result recorded in the environmental magnetic shield influence control chart every time, a dynamic monitoring chart of the influence of the environmental magnetic shield is obtained. The invention provides the method for monitoring the environmental magnetic shield of the electronic scanning microscope by utilizing the line width and the line width roughness of the measured drawing.

Description

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Claims

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Application Information

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Owner SHANGHAI HUALI MICROELECTRONICS CORP
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