Metal organic compound chemical vapor deposition equipment

A technology of chemical vapor deposition and organic compounds, applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of reducing induction heating efficiency, affecting the uniformity of the process, increasing the cost of equipment use, etc., to achieve Improved induction heating efficiency, uniform temperature, and anti-oxidation effects

Active Publication Date: 2014-10-22
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Problems solved by technology

[0004] However, since the tray is perpendicular to the magnetic force lines, the magnetic force lines will pass through a section of atmosphere (or vacuum) after passing through one layer of trays and before reaching the next layer of trays, which will reduce the efficiency of induction heating and increase the cost of equipment use, which is also not conducive to Creates a uniform temperature distribution inside the tray
Since the MOCVD process requires high temperature uniformity, the above-mentioned shortcomings are likely to affect the uniformity of the process, thereby affecting the quality of the product

Method used

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  • Metal organic compound chemical vapor deposition equipment
  • Metal organic compound chemical vapor deposition equipment
  • Metal organic compound chemical vapor deposition equipment

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Embodiment Construction

[0027] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.

[0028] In the description of the present invention, the orientation or positional relationship indicated by the terms "inner", "outer", "upper", "lower" etc. are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention. There is no requirement that the invention be constructed and operated in a particular orientation, and thus no limitation should be construed.

[0029] Refer below Figure 1-Figure 3 The chamber assembly according to the embodiment of...

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Abstract

A cavity component comprises: a cavity outer sleeve, forming an outer sleeve cavity by encircling the cavity; induction coils, enclosing the outside of the cavity outer sleeve; and a graphite sleeve, sleeved inside the outer sleeve cavity of the cavity outer sleeve. Also disclosed is a metal-organic chemical vapor deposition (MOCVD) device provided with the cavity component.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a chemical vapor deposition equipment for organic compounds. Background technique [0002] Metal-organic compound chemical vapor deposition (MOCVD: Metal-organic Chemical Vapor Deposition) equipment is the key equipment for producing LED epitaxial wafers. The principle of MOCVD equipment is that the organic metal gas enters the reaction chamber, and when it passes through the surface of the high-temperature substrate, a high-temperature chemical reaction occurs, and a film is deposited on the surface of the substrate. By adjusting the process gas and process time, MOCVD equipment can be used to deposit various films on the LED substrate, including the multi-quantum well structure that determines the luminous performance of the LED. In the process of depositing multiple quantum wells, in order to ensure the uniformity of the film, the temperature uniformity of the substrat...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/46C23C16/44
CPCC23C16/46
Inventor 周卫国
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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