Unlock instant, AI-driven research and patent intelligence for your innovation.

Etching device and etching method

An etching device and etching tank technology, applied in the field of etching, can solve problems such as increased cost, inability to obtain circuit patterns, cumbersome process flow, etc., and achieve the effect of improving quality

Inactive Publication Date: 2014-06-25
AVARY HLDG (SHENZHEN) CO LTD +1
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the distance between the upper and lower nozzles and the circuit board is fixed, when the copper foil layers on the upper and lower sides of the circuit board need to etch the circuit patterns of different line widths formed, especially on the upper and lower sides of the circuit board When the copper foil layers on both sides have different thicknesses, only by adjusting the spray pressure of the etching solution sprayed by the upper and lower nozzles and adjusting the speed of the conveying roller group to convey the circuit board, the circuit pattern with the required line width cannot be obtained.
To solve this problem, there are mainly two existing methods: one is to adjust the spray pressure and transmission speed by sacrificing the quality of the line pattern on a certain side. It will cause the line width of the line pattern on the other side to become thicker or the etching is insufficient to cause a short circuit; the second is to etch the line pattern on the first side first, and then form the line pattern on the other side after etching. Membranes and make the process cumbersome, thus increasing the cost

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Etching device and etching method
  • Etching device and etching method
  • Etching device and etching method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0054] The etching device and etching method of the technical solution will be further described in detail below with reference to the drawings and embodiments.

[0055] see Figure 1 to Figure 3 , the technical solution provides an etching device 10 for etching a circuit board 20 . The etching device 10 includes an etching tank 11 , a set of conveying rollers 12 , an upper spraying device 13 , a lower spraying device 14 , a first lifting mechanism 15 and a second lifting mechanism 16 . The conveying roller set 12 , the upper spraying device 13 and the lower spraying device 14 are all arranged in the etching tank 11 . The upper spraying device 13 and the lower spraying device 14 are used for spraying etching solution on two opposite surfaces of the circuit board 20 respectively. The first lifting mechanism 15 is installed in the etching tank 11 and connected with the upper shower device 13 , and the second lifting mechanism 16 is installed in the etching tank 11 and connecte...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

An etching device comprises an etching groove, transfer roller groups, an upper spraying means, a lower spraying means, a first elevating mechanism and a second elevating mechanism. The transfer roller groups, the upper spraying means and the lower spraying means are arranged in the etching groove. The transfer roller groups comprise a plurality of upper transfer rollers and a plurality of lower transfer rollers. The upper spraying means is positioned above the plurality of the upper transfer rollers, and the lower spraying means is positioned below the plurality of the lower transfer rollers. The first elevating mechanism is installed in the etching groove, and is connected with the upper spraying means so as to drive the upper spraying means to move in a direction perpendicular to that of circuit board delivering, relative to the plurality of the upper transfer rollers. The second elevating mechanism is also installed in the etching groove, and is connected with the lower spraying means to drive the lower spraying means to move in a direction perpendicular to that of circuit board delivering, relative to the plurality of the lower transfer rollers. The invention further provides an etching method for etching circuit boards by means of the etching device.

Description

technical field [0001] The invention relates to etching technology, in particular to an etching device and an etching method. Background technique [0002] With the rapid development of the electronic industry, the manufacturing technology of circuit boards, which are the basic components of electronic products, is becoming more and more important. The circuit board is generally made of a copper-clad substrate through a series of processes such as cutting, drilling, copper plating, exposure, development, etching, pressing, printing, and molding. For details, please refer to the article "Dielectric characterization of printed circuit board substrates" published by C.H.Steer et al. in Proceedings of the IEEE, Vol.39, No.2 (August 2002). [0003] Among them, etching is an important manufacturing process of circuit board production, which mainly uses an etching device to selectively etch the copper foil layer on the surface of the circuit board to form circuit patterns. The ex...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23F1/08C23F1/02
Inventor 郑建邦
Owner AVARY HLDG (SHENZHEN) CO LTD