Isotope battery with gallium-nitride-based multi-junction energy conversion unit
An isotope battery, gallium nitride-based technology, applied in the field of gallium nitride-based multi-junction transducing unit isotope batteries, can solve the problems of small short-circuit current and open-circuit voltage, low output performance, etc., and achieve the effect of small size
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Embodiment 1
[0018] figure 1 It is a structural schematic diagram of a gallium nitride-based multi-junction transducing unit isotope battery of the present invention. figure 1 Among them, the gallium nitride-based multi-junction transducing unit isotope battery of the present invention contains a gallium nitride-based multi-junction transducing unit and auxiliary components; the transducing unit includes a sapphire substrate 18, a buffer layer 16, N gallium nitride Layer 14, N + GaN layer 15, i GaN layer 13, p + Gallium nitride layer 11, P gallium nitride layer 12, SiO 2 The protective layer 10, the front electrode 2 and the stepped electrode 5; the arrangement relationship of each part in the gallium nitride-based multi-junction transduction unit is, SiO 2 Protective layer 10, P + Gallium nitride layer 11, P gallium nitride layer 12, i gallium nitride layer 13, N gallium nitride layer 14, N gallium nitride layer + Gallium nitride layer 15, buffer layer 16, and sapphire substrate 18 a...
Embodiment 2
[0022] The basic structure and arrangement relationship of this embodiment are the same as those of Example 1, the difference is that the arrangement relationship of each part in the gallium nitride-based multi-junction transduction unit in this embodiment is, SiO 2 protective layer, N + GaN layer, N GaN layer, i GaN layer, P GaN layer, P + Gallium nitride layer, buffer layer, and sapphire substrate are arranged sequentially from top to bottom. + The front electrode is made on the surface of the gallium nitride layer and is not covered by SiO 2 protection cover, the P + The exposed annular surface of the gallium nitride layer is used to make step electrodes, which constitute the N + NiPP + GaN-based multi-junction transducer unit. P in this example + GaN layer doping concentration is 1×10 18 / cm 3 , P GaN layer doping concentration is 1×10 17 / cm 3 , the i gallium nitride layer is an unintentionally doped layer, and the doping concentration of the n gallium nitride l...
Embodiment 3
[0024] The basic structure and arrangement relationship of this embodiment are the same as those of Embodiment 1, except that the radiation source sheet 1 in this embodiment is an H-3 radiation source sheet.
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