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Electromagnetic actuator, stage apparatus and lithographic apparatus

An electromagnetic actuator and actuator technology, applied in the field of platform equipment, lithography equipment, and electromagnetic actuators, can solve the problem of compensating disturbance force and/or torque, affecting positioning accuracy, predicting actuator response, etc. question

Active Publication Date: 2015-06-10
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Also, with known variable reluctance actuators, it can be difficult to predict the actuator response when a particular magnetizing current is applied
Likewise, it may also be difficult to compensate for such disturbing forces and / or torques generated, known as crosstalk, thereby adversely affecting the achievable positioning accuracy

Method used

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  • Electromagnetic actuator, stage apparatus and lithographic apparatus
  • Electromagnetic actuator, stage apparatus and lithographic apparatus
  • Electromagnetic actuator, stage apparatus and lithographic apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] figure 1 A lithographic apparatus according to an embodiment of the invention is schematically shown. The lithographic apparatus comprises: an illumination system (illuminator) IL configured to condition a radiation beam B (e.g., ultraviolet (UV) radiation or any other suitable radiation); a mask support structure or a patterning device support structure ( For example a mask table) MT configured to support a patterning device (eg a mask) MA and connected to a first positioning device PM for precisely positioning the patterning device MA according to determined parameters. For precise positioning of the patterning device, the positioning device PM may be equipped with one or more actuators according to the invention, more details of which actuators are given below. The apparatus also includes a substrate table (e.g., wafer table) WT or "substrate support structure" configured to hold a substrate (e.g., a resist-coated wafer) W and configured for use according to a deter...

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PUM

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Abstract

An electromagnetic actuator (300) includes a first and second magnetic members (310,320) that are displaceable relative to each other and are arranged to provide a magnetic circuit; and a coil (340.1, 340.2) configured to, in use, receive a current to generate a magnetic flux through the magnetic circuit, thereby generating a force between the first and second magnetic members in a first direction (Y), the magnetic flux, in use, being transferred between the first and second magnetic members through a first surface (312) of the first magnetic member and a second surface (322) of the second magnetic member, the first and second surface being separated by an airgap (390), wherein the first surface and the second surface are arranged relative to each other such that an outer dimension (L1) of the first surface extends beyond an outer dimension (L2) of the second surface in a second direction substantially perpendicular to the first direction.

Description

technical field [0001] The invention relates to an electromagnetic actuator, platform equipment and photolithography equipment. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred by imaging the pattern onto a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single substrate will contain a network of adjacent target portions that are successively patterned. Known lithographic apparatuses inc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCH01F7/081H01F7/122H01F7/1646G03F7/70758H02K41/0356H01L21/0273
Inventor S·A·J·霍尔J·范埃基科J·P·M·B·沃麦尤伦G·J·P·尼希黄仰山M·W·T·库特J·德保伊M·H·希曼周伟S·B·C·M·马顿斯
Owner ASML NETHERLANDS BV