Packaging-first and etching-later manufacturing method for chip formal double-surface three-dimensional circuit and packaging structure of chip formal double-surface three-dimensional circuit
A three-dimensional circuit, sealing first and etching later technology, which is applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc., can solve the problems of great differences in material characteristics, stress deformation, and reliability levels that affect reliability and safety capabilities. Achieve the effects of not being easy to stress and deform, reducing environmental pollution, and improving safety
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Embodiment 1
[0136] Embodiment 1, no base island
[0137] Step 1. Take the metal substrate
[0138] see figure 1 , take a metal substrate with a suitable thickness, the material of the metal substrate can be changed according to the function and characteristics of the chip, for example: copper, iron, nickel-iron or zinc-iron;
[0139] Step 2. Pre-plating copper on the surface of the metal substrate
[0140] see figure 2 , electroplating a layer of copper film on the surface of the metal substrate, the purpose is to serve as a basis for subsequent electroplating, and the electroplating method can be electroless plating or electrolytic plating;
[0141] Step 3, green paint coating
[0142] see image 3 In step 2, the front and back of the metal substrate of the pre-plated copper film are covered with green paint to protect the subsequent electroplating metal layer process operations;
[0143] Step 4. Remove part of the green paint from the front of the metal substrate
[0144] see ...
Embodiment 2
[0212] Embodiment 2, there is base island
[0213] Step 1. Take the metal substrate
[0214] see Figure 38 , take a metal substrate with a suitable thickness, the material of the metal substrate can be changed according to the function and characteristics of the chip, for example: copper, iron, nickel-iron or zinc-iron;
[0215] Step 2. Pre-plating copper on the surface of the metal substrate
[0216] see Figure 39 , electroplating a layer of copper film on the surface of the metal substrate, the purpose is to serve as a basis for subsequent electroplating, and the electroplating method can be electroless plating or electrolytic plating;
[0217] Step 3, green paint coating
[0218] see Figure 40 In step 2, the front and back of the metal substrate of the pre-plated copper film are covered with green paint to protect the subsequent electroplating metal layer process;
[0219] Step 4. Remove part of the green paint from the front of the metal substrate
[0220] see Fi...
Embodiment 3
[0288] Embodiment 3, there is an electrostatic discharge ring with a base island
[0289] Step 1. Take the metal substrate
[0290] see Figure 75 , take a metal substrate with a suitable thickness, the material of the metal substrate can be changed according to the function and characteristics of the chip, for example: copper, iron, nickel-iron or zinc-iron;
[0291] Step 2. Pre-plating copper on the surface of the metal substrate
[0292] see Figure 76 , electroplating a layer of copper film on the surface of the metal substrate, the purpose is to serve as a basis for subsequent electroplating, and the electroplating method can be electroless plating or electrolytic plating;
[0293] Step 3, green paint coating
[0294] see Figure 77 In step 2, the front and back of the metal substrate of the pre-plated copper film are covered with green paint to protect the subsequent electroplating metal layer process operations;
[0295] Step 4. Remove part of the green paint from...
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