The invention relates to a flip-
chip single-face three-dimensional circuit fabrication method by
etching-first and packaging-second and a packaging structure of a flip-
chip single-face three-dimensional circuit. The method includes following steps: picking a
metal substrate, pre-coppering the surface of the
metal substrate, sticking photo-resistant films, removing part of the photo-resistant films on the back of the
metal substrate,
electroplating an
inert metal circuit layer,
electroplating a metal circuit layer, removing the photo-resistant films, packaging,
processing a hole on the surface of plastic-packaged materials, grooving,
electroplating conductive metal, pretreating before metallization, electroplating a metal circuit layer, chemically
etching, electroplating a metal circuit layer, mounting a
chip and filling at the bottom of the chip, cleaning, balling and
cutting to obtain a finished product. The flip-chip single-face three-dimensional circuit fabrication method by
etching-first and packaging-second and the packaging structure of the flip-chip single-face three-dimensional circuit have the advantages that fabrication cost is lowered, safety and reliability of a packaged body is improved, environmental
pollution is reduced, and design and fabrication of high-density circuits can be truly realized.