The invention relates to a packaging-first and
etching-later manufacturing method for a
chip formal double-surface three-dimensional circuit. The method comprises the following technology steps of taking a
metal substrate; pre-plating
copper material on the surface of the
metal substrate; carrying out the operation of pasting a photo-resisting film; removing a part of the photo-resisting film from the front surface of the
metal substrate; electro-plating an
inert metal circuit layer; electro-plating a metal circuit layer; packaging; carrying out the operation of pasting the photo-resisting film; tapping on the surface of plastic
package material; electro-plating the metal circuit layer;
coating bonding materials; installing a
chip; bonding with metal wires; packaging; carrying out the operation of pasting the photo-resisting film; chemical-
etching; electro-plating the metal circuit layer; packaging; tapping on the surface of plastic
package material; digging a groove on the surface of the plastic
package material; electro-plating the metal circuit layer;
coating a circuit screen plate; pre-
processing of metallization; removing the metal screen plate; electro-plating the metal circuit layer; packaging; tapping on the surface of plastic package material; cleaning; implanting a metal ball; and
cutting a finished product. The method disclosed by the invention has the beneficial effects that the manufacturing cost is lowered, the safety and the reliability of a packaging body are increased, the environment
pollution is reduced, and the design and the manufacturing of a high-density circuit can be really realized.